Atomic layer deposition of vanadium oxides using vanadyl acetylacetonate as the precursor

• Published in: Thin solid films Vol. 725; p. 138639
• Main Authors: Juan, Pi-Chun, Lin, Kuei-Chih, Cho, Wen-Hao, Chen, Chien-Lin, Yang, Cheng-Ye, Kei, Chi-Chung, Li, Guo-Ren
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.05.2021
• Subjects: Atomic layer deposition; Thermochromic films; Vanadium dioxide, X-ray photoelectron spectroscopy; Atomic layer deposition; Thermochromic films; Vanadium dioxide, X-ray photoelectron spectroscopy
• DOI: 10.1016/j.tsf.2021.138639
• ISSN: 0040-6090

•A growth temperature of 420°C for decomposition of VO(acac)2 is optimally required.•Thermochromic properties are present by atomic layer deposition with VO(acac)2.•Annealing temperature much influences inter-diffusion of atoms on thermochromics. Thermochromic VO2 thin films are fabricated by atomic layer deposition with vanadyl acetylacetonate as the precursor. The crystallization process has been performed by post-annealing process, i.e. rapid thermal annealing. The effect of annealing temperature on thermochromic properties is investigated. Though the transmittance increases with increasing annealing temperature, a moderate temperature is suggested by the consideration of atomic inter-diffusion between TiO2 and VO2 layers. It is found that an oxygen-deficient phase of V2O3 appears at low annealing temperatures, while an oxygen-ambient phase of V2O5 presents at high temperatures. Additionally, a ternary compound, Ti3V6O17 is dominant beyond 700°C. The crystalline behavior of monoclinic phase of VO2 and Ti3V6O17 observed from the X-ray diffraction pattern is further examined by high resolution transmission electron microscope. The depth profiling in binding energies of V 2p, O 1s and Ti 2p orbits are compared.