Investigation of fluoride and silica removal from semiconductor wastewaters with a clean coagulation-ultrafiltration process

• Published in: Chemical engineering journal (Lausanne, Switzerland : 1996) Vol. 438; p. 135562
• Main Authors: Qiu, Yangbo, Ren, Long-Fei, Xia, Lei, Shao, Jiahui, Zhao, Yan, Van der Bruggen, Bart
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 15.06.2022
• Subjects: Chemical mechanical polishing wastewater; Coagulant; Fluoride-containing wastewater; Membrane fouling; Ultrafiltration; Coagulant; Fluoride-containing wastewater; Ultrafiltration; Chemical mechanical polishing wastewater; Membrane fouling

[Display omitted] •CMP wastewater was used as a coagulant to accelerate suspended particles settling.•SiO2 and CaF2 particles would be attracted by electrostatic interaction.•Increasing n(SiO2:CaF2) reduced the attractive force between membrane and foulant.•Intermediate blocking and cake filtration...