Investigation of fluoride and silica removal from semiconductor wastewaters with a clean coagulation-ultrafiltration process
[Display omitted] •CMP wastewater was used as a coagulant to accelerate suspended particles settling.•SiO2 and CaF2 particles would be attracted by electrostatic interaction.•Increasing n(SiO2:CaF2) reduced the attractive force between membrane and foulant.•Intermediate blocking and cake filtration...
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| Published in | Chemical engineering journal (Lausanne, Switzerland : 1996) Vol. 438; p. 135562 |
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| Main Authors | , , , , , |
| Format | Journal Article |
| Language | English |
| Published |
Elsevier B.V
15.06.2022
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| Subjects | |
| Online Access | Get full text |
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| Abstract | [Display omitted]
•CMP wastewater was used as a coagulant to accelerate suspended particles settling.•SiO2 and CaF2 particles would be attracted by electrostatic interaction.•Increasing n(SiO2:CaF2) reduced the attractive force between membrane and foulant.•Intermediate blocking and cake filtration were observed at n(SiO2:CaF2) = 5 and 8.•The fluoride in UF permeate qualified the median fluoride effluent standard.
Fluoride and silica contamination in water is a worldwide issue due to the wastewater discharge from semiconductor industry. Coagulation-ultrafiltration (UF) process is commonly used to treat semiconductor wastewaters, but it requires excessive amounts of coagulant/flocculant. In this study, a clean coagulation-UF process using chemical mechanical polishing (CMP) wastewater as a coagulant to treat fluoride-containing wastewater was firstly proposed. The fluoride-containing wastewater, CMP wastewater, mixed fluoride-containing wastewater and CMP wastewater, and mixed fluoride-containing wastewater and polyaluminium chloride/polyacrylamide were compared to investigate turbidity removal efficiency, fluoride removal efficiency and membrane fouling resistance. The negatively charged SiO2 particles in CMP wastewater were found to be adsorbed on the positively charged CaF2 particles surface through electrostatic interaction. Results indicated that CMP wastewater provided a superior turbidity removal efficiency and a minimal membrane fouling resistance compared to conventional coagulant. After UF filtration, the fluoride concentration and turbidity were 2.09 mg L−1 and 0 NTU, respectively, which met the median fluoride effluent standard. The extended Derjaguin-Landau-Verwey-Overbeek theory showed that increasing molar ratio of SiO2 to CaF2 improved the interfacial free energy between membrane and suspended particles, thus mitigating membrane fouling. This clean design principle and strategy will broaden the sustainability of coagulation-UF process for wastewater treatment. |
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| AbstractList | [Display omitted]
•CMP wastewater was used as a coagulant to accelerate suspended particles settling.•SiO2 and CaF2 particles would be attracted by electrostatic interaction.•Increasing n(SiO2:CaF2) reduced the attractive force between membrane and foulant.•Intermediate blocking and cake filtration were observed at n(SiO2:CaF2) = 5 and 8.•The fluoride in UF permeate qualified the median fluoride effluent standard.
Fluoride and silica contamination in water is a worldwide issue due to the wastewater discharge from semiconductor industry. Coagulation-ultrafiltration (UF) process is commonly used to treat semiconductor wastewaters, but it requires excessive amounts of coagulant/flocculant. In this study, a clean coagulation-UF process using chemical mechanical polishing (CMP) wastewater as a coagulant to treat fluoride-containing wastewater was firstly proposed. The fluoride-containing wastewater, CMP wastewater, mixed fluoride-containing wastewater and CMP wastewater, and mixed fluoride-containing wastewater and polyaluminium chloride/polyacrylamide were compared to investigate turbidity removal efficiency, fluoride removal efficiency and membrane fouling resistance. The negatively charged SiO2 particles in CMP wastewater were found to be adsorbed on the positively charged CaF2 particles surface through electrostatic interaction. Results indicated that CMP wastewater provided a superior turbidity removal efficiency and a minimal membrane fouling resistance compared to conventional coagulant. After UF filtration, the fluoride concentration and turbidity were 2.09 mg L−1 and 0 NTU, respectively, which met the median fluoride effluent standard. The extended Derjaguin-Landau-Verwey-Overbeek theory showed that increasing molar ratio of SiO2 to CaF2 improved the interfacial free energy between membrane and suspended particles, thus mitigating membrane fouling. This clean design principle and strategy will broaden the sustainability of coagulation-UF process for wastewater treatment. |
| ArticleNumber | 135562 |
| Author | Qiu, Yangbo Van der Bruggen, Bart Shao, Jiahui Ren, Long-Fei Xia, Lei Zhao, Yan |
| Author_xml | – sequence: 1 givenname: Yangbo surname: Qiu fullname: Qiu, Yangbo organization: School of Environmental Science and Engineering, Shanghai Jiao Tong University, No. 800 Dongchuan Road, Shanghai 200240, PR China – sequence: 2 givenname: Long-Fei surname: Ren fullname: Ren, Long-Fei organization: School of Environmental Science and Engineering, Shanghai Jiao Tong University, No. 800 Dongchuan Road, Shanghai 200240, PR China – sequence: 3 givenname: Lei surname: Xia fullname: Xia, Lei organization: Division of Soil and Water Management, KU Leuven, Kasteelpark Arenberg 20, 3001 Leuven, Belgium – sequence: 4 givenname: Jiahui surname: Shao fullname: Shao, Jiahui email: jhshao@sjtu.edu.cn organization: School of Environmental Science and Engineering, Shanghai Jiao Tong University, No. 800 Dongchuan Road, Shanghai 200240, PR China – sequence: 5 givenname: Yan surname: Zhao fullname: Zhao, Yan email: yan.zhao@kuleuven.be organization: Department of Chemical Engineering, KU Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium – sequence: 6 givenname: Bart surname: Van der Bruggen fullname: Van der Bruggen, Bart organization: Department of Chemical Engineering, KU Leuven, Celestijnenlaan 200F, B-3001 Leuven, Belgium |
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| Keywords | Coagulant Fluoride-containing wastewater Ultrafiltration Chemical mechanical polishing wastewater Membrane fouling |
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