APA (7th ed.) Citation

Liu, H., Luan, R., Li, L., Lv, R., Chai, Y., & Dong, B. (2023). Sulphur-dopant induced breaking of the scaling relation on low-valence Ni sites in nickel ferrite nanocones for water oxidation with industrial-level current density. Chemical engineering journal (Lausanne, Switzerland : 1996), 461, 141714. https://doi.org/10.1016/j.cej.2023.141714

Chicago Style (17th ed.) Citation

Liu, Hai-Jun, Ren-Ni Luan, Lu-Yao Li, Ren-Qing Lv, Yong-Ming Chai, and Bin Dong. "Sulphur-dopant Induced Breaking of the Scaling Relation on Low-valence Ni Sites in Nickel Ferrite Nanocones for Water Oxidation with Industrial-level Current Density." Chemical Engineering Journal (Lausanne, Switzerland : 1996) 461 (2023): 141714. https://doi.org/10.1016/j.cej.2023.141714.

MLA (9th ed.) Citation

Liu, Hai-Jun, et al. "Sulphur-dopant Induced Breaking of the Scaling Relation on Low-valence Ni Sites in Nickel Ferrite Nanocones for Water Oxidation with Industrial-level Current Density." Chemical Engineering Journal (Lausanne, Switzerland : 1996), vol. 461, 2023, p. 141714, https://doi.org/10.1016/j.cej.2023.141714.