Adjusting accommodation microenvironment for Cu+ to enhance oxidation inhibition for thiophene capture

Cu+‐containing materials have great potentials in various applications like adsorptive desulfurization. Nevertheless, their applications are severely obstructed by poor stability of Cu+ in air. Here, we first clarify the mechanism of Cu+ oxidation by first‐principle calculations and demonstrate that...

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Bibliographic Details
Published inAIChE journal Vol. 67; no. 10
Main Authors Li, Yu‐Xia, Jin, Meng‐Meng, Shi, Shu, Qi, Shi‐Chao, Liu, Xiao‐Qin, Sun, Lin‐Bing
Format Journal Article
LanguageEnglish
Published Hoboken, USA John Wiley & Sons, Inc 01.10.2021
American Institute of Chemical Engineers
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Summary:Cu+‐containing materials have great potentials in various applications like adsorptive desulfurization. Nevertheless, their applications are severely obstructed by poor stability of Cu+ in air. Here, we first clarify the mechanism of Cu+ oxidation by first‐principle calculations and demonstrate that moisture accelerates Cu+ oxidation dramatically. Then, the microenvironment of Cu2O‐modified HKUST‐1, a typical metal‐organic framework, is adjusted from hydrophilic to hydrophobic with polydimethylsiloxane coating (producing Cu2O@HK@P). This isolates moisture from pores and enhances the stability of Cu+ significantly even under oxygen atmosphere. Cu+ in Cu2O@HK@P preserves well after exposed to air for 6 months, while Cu2O@HK lose almost all Cu+ for 2 weeks. The optimal Cu2O@HK@P can remove 540 μmol g−1 of thiophene from hydrous fuel, which is much superior to Cu2O@HK (227 μmol g−1) and most reported adsorbents. Our strategy can also be applied to stabilize Cu+ in various materials including zeolite, mesoporous silica, and activated carbon.
Bibliography:Funding information
China Postdoctoral Science Foundation, Grant/Award Number: 2019M661813; National Natural Science Foundation of China, Grant/Award Numbers: 22008112, 21878149, 21576137, 21676138, 21722606
ObjectType-Article-1
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content type line 14
ISSN:0001-1541
1547-5905
DOI:10.1002/aic.17368