Structure and properties of Ta doped TiN films prepared using different sputtering powers for Ta target

• Published in: Processing and Application of Ceramics Vol. 16; no. 3; pp. 191 - 200
• Main Authors: Wang, Yuemeng, Shi, Xinwei, Liu, Miaomiao, Yang, Yifan, Gao, Qilong, Zhu, Bailin, Xu, Liujie
• Format: Journal Article
• Language: English
• Published: University of Novi Sad 01.01.2022
• Subjects: (tita)n film; co-sputtering; low-emission films; raman spectroscopy

Ta doped TiN films were prepared on glass substrates by DC magnetron co-sputtering. The structure and properties of the obtained (Ti,Ta)N film were characterized by X-ray diffraction, Raman spectroscopy, ultraviolet/visible/near-infrared spectrophotometer and four probes method. The results show tha...