Direct Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography

• Published in: Macromolecular research Vol. 13; no. 5; pp. 435 - 440
• Main Authors: Yoon, Bo Kyung, Hwang, Wonseok, Park, Youn Jung, Hwang, Jiyoung, Park, Cheolmin, Chang, Joonyeon
• Format: Journal Article
• Language: English
• Published: 한국고분자학회 01.10.2005
• Subjects: 고분자공학; block copolymer; electron beam Lithography; self assembly; nanopattern mask

This study describes a method where the match of two different length scales, i.e., the patterns from self-assembled block copolymer (<50nm) and electron beam writing (>50nm), allow the nanometer scale pattern mask. The method is based on using block copolymers containing a poly(methyl methacr...