Yoon, B. K., Hwang, W., Park, Y. J., Hwang, J., Park, C., & Chang, J. (2005). Direct Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography. Macromolecular research, 13(5), 435-440. https://doi.org/10.1007/bf03218477
Chicago Style (17th ed.) CitationYoon, Bo Kyung, Wonseok Hwang, Youn Jung Park, Jiyoung Hwang, Cheolmin Park, and Joonyeon Chang. "Direct Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography." Macromolecular Research 13, no. 5 (2005): 435-440. https://doi.org/10.1007/bf03218477.
MLA (9th ed.) CitationYoon, Bo Kyung, et al. "Direct Patterning of Self Assembled Nano-Structures of Block Copolymers via Electron Beam Lithography." Macromolecular Research, vol. 13, no. 5, 2005, pp. 435-440, https://doi.org/10.1007/bf03218477.