Realization of 256--278 nm AlGaN-Based Deep-Ultraviolet Light-Emitting Diodes on Si Substrates Using Epitaxial Lateral Overgrowth AlN Templates

We demonstrated 256--278 nm AlGaN-based deep-ultraviolet (DUV) light-emitting diodes (LEDs) on Si substrates by using epitaxial lateral overgrowth (ELO) AlN templates. A 4-μm-thick ELO-AlN layer grown in a striped pattern along the $\langle 10\bar{1}0\rangle$ direction can be coalesced successfully....

Full description

Saved in:
Bibliographic Details
Published inApplied physics express Vol. 4; no. 9; pp. 092104 - 092104-3
Main Authors Mino, Takuya, Hirayama, Hideki, Takano, Takayoshi, Tsubaki, Kenji, Sugiyama, Masakazu
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.09.2011
Online AccessGet full text

Cover

Loading…
More Information
Summary:We demonstrated 256--278 nm AlGaN-based deep-ultraviolet (DUV) light-emitting diodes (LEDs) on Si substrates by using epitaxial lateral overgrowth (ELO) AlN templates. A 4-μm-thick ELO-AlN layer grown in a striped pattern along the $\langle 10\bar{1}0\rangle$ direction can be coalesced successfully. Low-threading-dislocation-density AlN templates were achieved on Si wafers by a combination of the ELO and NH 3 pulsed-flow multilayer growth methods. Single-peaked AlGaN LEDs with wavelengths shorter than 280 nm were achieved by fabricating them on ELO-AlN templates on Si. These low-cost AlGaN-based DUV LEDs on Si substrates are expected to be integrated on the same chips with Si-based electrical circuits.
Bibliography:Differential interference contrast (DIC) and bird's-eye-view SEM images of ELO-AlN templates grown on trench-patterned AlN/Si with the direction of stripes formed along (a) $\langle 11\bar{2}0\rangle$ and (b) $\langle 10\bar{1}0\rangle$ of AlN. Cross-sectional (a) SEM and (b) TEM images of ELO-AlN templates grown on $\langle 10\bar{1}0\rangle$-trench-patterned AlN/Si. (a) (0002) and (b) ($10\bar{1}2$) X-ray diffraction $\omega$-scan rocking curves for the 4-μm-thick ELO-AlN template and 300-nm-thick AlN layer before the ELO process. Schematic structure of an AlGaN-based DUV LED fabricated on the $\langle 10\bar{1}0\rangle$-trench-patterned ELO-AlN/Si template on a Si substrate. Electroluminescence spectra and a typical $I$--$V$ curve of the AlGaN-based DUV LEDs on ELO-AlN templates on Si measured at room temperature.
ISSN:1882-0778
1882-0786
DOI:10.1143/APEX.4.092104