Multi-Axis Resonant Filter Design using Frequency Response Data applied to Industrial Scan Stage

Disturbance rejection of the high-precision scan stages is important in industrial lithography equipment. The aim of this article is to develop an optimization method for designing multi-axis resonant filters, that enhance the disturbance rejection performance in scanning motion. The developed optim...

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Bibliographic Details
Published inIEEE/ASME transactions on mechatronics Vol. 29; no. 4; pp. 2867 - 2876
Main Authors Mae, Masahiro, Ohnishi, Wataru, Fujimoto, Hiroshi, Sakata, Koichi
Format Journal Article
LanguageEnglish
Published New York IEEE 01.08.2024
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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