Multi-Axis Resonant Filter Design using Frequency Response Data applied to Industrial Scan Stage
Disturbance rejection of the high-precision scan stages is important in industrial lithography equipment. The aim of this article is to develop an optimization method for designing multi-axis resonant filters, that enhance the disturbance rejection performance in scanning motion. The developed optim...
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Published in | IEEE/ASME transactions on mechatronics Vol. 29; no. 4; pp. 2867 - 2876 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
New York
IEEE
01.08.2024
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects | |
Online Access | Get full text |
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