Synthesis of ZrO2/Y2O3 by combined arc and magnetron sputtering technique
Preparation of yttria-stabilized zirconia (YSZ) films by combined reactive arc evaporation and magnetron sputtering was investigated in this work. At first, the dependencies of the film deposition rate on oxygen partial pressure, arc discharge current and magnetron discharge power were measured. Aft...
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Published in | Surface & coatings technology Vol. 180-181; pp. 53 - 58 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
01.03.2004
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Abstract | Preparation of yttria-stabilized zirconia (YSZ) films by combined reactive arc evaporation and magnetron sputtering was investigated in this work. At first, the dependencies of the film deposition rate on oxygen partial pressure, arc discharge current and magnetron discharge power were measured. After complete analysis of the process of arc-magnetron deposition, the YSZ thin films were deposited on silicon, on the alloy-600 and on the ZrO2 ceramic substrates at a substrate temperature of 400DGC. The structure and refractive index of films were investigated by X-ray diffraction and ellipsometry, respectively. |
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AbstractList | Preparation of yttria-stabilized zirconia (YSZ) films by combined reactive arc evaporation and magnetron sputtering was investigated in this work. At first, the dependencies of the film deposition rate on oxygen partial pressure, arc discharge current and magnetron discharge power were measured. After complete analysis of the process of arc-magnetron deposition, the YSZ thin films were deposited on silicon, on the alloy-600 and on the ZrO2 ceramic substrates at a substrate temperature of 400DGC. The structure and refractive index of films were investigated by X-ray diffraction and ellipsometry, respectively. |
Author | Rakauskas, A. Čyvien≐, J. Milčius, D. Laurikaitis, M. Dudonis, J. |
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CitedBy_id | crossref_primary_10_1134_S0030400X19120282 crossref_primary_10_1016_j_tsf_2005_12_242 crossref_primary_10_1016_j_tsf_2006_01_049 crossref_primary_10_1016_j_surfcoat_2020_126177 crossref_primary_10_1002_adem_201000170 crossref_primary_10_1016_j_surfcoat_2005_08_091 crossref_primary_10_1016_j_surfcoat_2005_11_055 crossref_primary_10_1016_j_surfcoat_2011_08_005 crossref_primary_10_1016_j_surfcoat_2017_11_049 crossref_primary_10_1016_j_surfcoat_2005_08_138 |
Cites_doi | 10.1016/S0042-207X(99)00142-6 10.1016/S0040-6090(02)00738-1 10.1016/S0167-2738(00)00624-X 10.1016/S0169-4332(02)01088-7 10.1016/S0040-6090(97)01053-5 |
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