Atomic scale epitaxial growth of BaTiO3 thin films by laser molecular beam epitaxy

By using laser molecular beam epitaxy (L-MBE), atomic scale epitaxial growth of BaTiO3(BTO) thin films on SrTiO3 (STO) substrates is achieved. Measurements of reflection high energy electron diffraction (RHEED), X-ray diffraction (XRD), scanning electron microscopy, and transmission electron microsc...

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Published inScience China. Mathematics Vol. 40; no. 5; pp. 522 - 527
Main Author 王会生 马昆 刘彦巍 彭志强 崔大复 吕惠宾 周岳亮 陈正豪 李林 杨国桢
Format Journal Article
LanguageEnglish
Published Heidelberg Springer Nature B.V 01.05.1997
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ISSN1674-7283
1006-9283
1869-1862
1862-2763
DOI10.1007/BF02896960

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Summary:By using laser molecular beam epitaxy (L-MBE), atomic scale epitaxial growth of BaTiO3(BTO) thin films on SrTiO3 (STO) substrates is achieved. Measurements of reflection high energy electron diffraction (RHEED), X-ray diffraction (XRD), scanning electron microscopy, and transmission electron microscopy reveal that the BTO films are c-axis oriented single crystals with smooth surface. The multi-layer ferroelectric/superconducting heterostructures are also prepared and the ferroelectric properties of BTO films are studied. The results show that by using L-MBE technique, high quality BTO films and improved device performance can be obtained.
Bibliography:WANG Huisheng MA Kun , LIU YanweiPENG Zhiqiang , CUI Dafu LU HuibinZHOU Yueliang CHEN Zhenghao , LI Lin and YANG Guozhen(Laboratoryof Optical Physics, Institute of Physics and Center for Condensed Matter Physics, Chinese Academyof Sciences, Beijing 100080, China)
11-5837/O1
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
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ISSN:1674-7283
1006-9283
1869-1862
1862-2763
DOI:10.1007/BF02896960