The Fourier analysis of the x-ray diffraction profiles obtained from sputtered tantalum films
A method using Fourier analysis of the X-ray diffraction profile is proposed for estimating the nitrogen content in sputtered tantalum films. The results obtained from computer simulation of a two-crystalline system consisting of b.c.c. tantalum and tantalum nitride revealed that the third harmonics...
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| Published in | Thin solid films Vol. 43; no. 3; pp. 235 - 241 |
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| Main Authors | , |
| Format | Journal Article |
| Language | English |
| Published |
Elsevier B.V
15.06.1977
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| Online Access | Get full text |
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| Summary: | A method using Fourier analysis of the X-ray diffraction profile is proposed for estimating the nitrogen content in sputtered tantalum films. The results obtained from computer simulation of a two-crystalline system consisting of b.c.c. tantalum and tantalum nitride revealed that the third harmonics of the Fourier components (derived from the diffraction profile of the Cu Kα characteristic ray for 2
θ = 30−45°) could possibly be used as a measure of the nitrogen content of the films. The experimental results confirmed this, and the temperature coefficient of resistance of the films plotted as a function of the third Fourier component showed a plateau region for a Fourier component from −0.1 to +0.6. |
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| Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
| ISSN: | 0040-6090 1879-2731 |
| DOI: | 10.1016/0040-6090(77)90284-X |