Initial oxidation processes of ultrathin hafnium film and hafnium disilicide islands on Si(100)-2 × 1 surfaces studied using core-level X-ray photoelectron spectroscopy - Kakiuchi, Takuhiro; Yamasaki, Hideki; Tsukada, Chie; Yoshigoe, Akitaka (Surface science, 2020)
Keywords: Core-level photoelectron spectroscopy; Hafnium oxides; High-dielectric-constant material; Initial oxidation process; Metal-insulator-semiconductor structure; Synchrotron radiation; Hafnium oxides; Metal-insulator-semiconductor structure; Core-level photoelectron spectroscopy; High-dielectric-constant material; Initial oxidation process; Synchrotron radiation