APA (7th ed.) Citation

Kakiuchi, T., Yamasaki, H., Tsukada, C., & Yoshigoe, A. (2020). Initial oxidation processes of ultrathin hafnium film and hafnium disilicide islands on Si(100)-2 × 1 surfaces studied using core-level X-ray photoelectron spectroscopy. Surface science, 693, 121551. https://doi.org/10.1016/j.susc.2019.121551

Chicago Style (17th ed.) Citation

Kakiuchi, Takuhiro, Hideki Yamasaki, Chie Tsukada, and Akitaka Yoshigoe. "Initial Oxidation Processes of Ultrathin Hafnium Film and Hafnium Disilicide Islands on Si(100)-2 × 1 Surfaces Studied Using Core-level X-ray Photoelectron Spectroscopy." Surface Science 693 (2020): 121551. https://doi.org/10.1016/j.susc.2019.121551.

MLA (9th ed.) Citation

Kakiuchi, Takuhiro, et al. "Initial Oxidation Processes of Ultrathin Hafnium Film and Hafnium Disilicide Islands on Si(100)-2 × 1 Surfaces Studied Using Core-level X-ray Photoelectron Spectroscopy." Surface Science, vol. 693, 2020, p. 121551, https://doi.org/10.1016/j.susc.2019.121551.