李永涛, 侯. 郑. 贾. 陶. 刘. 姜. 张. 孙. (2017). Crystalline silicon surface passivation investigated by thermal atomic-layer-deposited aluminum oxide. Chinese physics B, 26(9), 478-482. https://doi.org/10.1088/1674-1056/26/9/098103
Chicago Style (17th ed.) Citation李永涛, 侯彩霞 郑新和 贾锐 陶科 刘三姐 姜帅 张鹏飞 孙恒超. "Crystalline Silicon Surface Passivation Investigated by Thermal Atomic-layer-deposited Aluminum Oxide." Chinese Physics B 26, no. 9 (2017): 478-482. https://doi.org/10.1088/1674-1056/26/9/098103.
MLA (9th ed.) Citation李永涛, 侯彩霞 郑新和 贾锐 陶科 刘三姐 姜帅 张鹏飞 孙恒超. "Crystalline Silicon Surface Passivation Investigated by Thermal Atomic-layer-deposited Aluminum Oxide." Chinese Physics B, vol. 26, no. 9, 2017, pp. 478-482, https://doi.org/10.1088/1674-1056/26/9/098103.
Warning: These citations may not always be 100% accurate.