Optimizing process conditions for improved Hf1−xZrxO2 ferroelectric capacitor performance - Mittmann, Terence; Fengler, Franz P.G.; Richter, Claudia; Park, Min Hyuk; Mikolajick, Thomas; Schroeder, Uwe (Microelectronic engineering, 2017)
Keywords: ALD process; Ferroelectrics; Hafnium oxide; Hafnium oxide; ALD process; Ferroelectrics