Exploring conductivity in ex-situ doped Si thin films as thickness approaches 5 nm - MacHale, John; Meaney, Fintan; Kennedy, Noel; Eaton, Luke; Mirabelli, Gioele; White, Mary; Thomas, Kevin; Pelucchi, Emanuele; Petersen, Dirch Hjorth; Lin, Rong; Petkov, Nikolay; Connolly, James; et al. (Journal of applied physics, 2019)
Keywords: Applied physics; Arsenic; Contact resistance; Density functional theory; Doping; Electric contacts; Electrical resistivity; Film thickness; Ion implantation; Material properties; Monolayers; Nanowires; Parasitics (electronics); Phosphorus; Silicon films; Thin films; Vapor phases