APA (7th ed.) Citation

MacHale, J., Meaney, F., Kennedy, N., Eaton, L., Mirabelli, G., White, M., . . . Duffy, R. (2019). Exploring conductivity in ex-situ doped Si thin films as thickness approaches 5 nm. Journal of applied physics, 125(22), . https://doi.org/10.1063/1.5098307

Chicago Style (17th ed.) Citation

MacHale, John, et al. "Exploring Conductivity in Ex-situ Doped Si Thin Films as Thickness Approaches 5 nm." Journal of Applied Physics 125, no. 22 (2019). https://doi.org/10.1063/1.5098307.

MLA (9th ed.) Citation

MacHale, John, et al. "Exploring Conductivity in Ex-situ Doped Si Thin Films as Thickness Approaches 5 nm." Journal of Applied Physics, vol. 125, no. 22, 2019, https://doi.org/10.1063/1.5098307.