Surface morphology and crystal structures of as-grown BiSrCaCuO thin films prepared by RF magnetron sputtering from three targets

As-grown superconducting BiSrCaCuO thin films were grown at 650°C on MgO(100) substrates by RF magnetron sputtering from three targets. The substrate was rotated over the three targets: Bi 3 Sr 2 Ca 2 Cu 3 O x , Bi 2 Sr 3 Ca 3 Cu 3 O x and Bi 2 Sr 2 Ca 2 Cu 4.5 O x . By adjusting the staying time of...

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Published inJapanese Journal of Applied Physics Vol. 28; no. 9; pp. 1586 - 1592
Main Authors KURODA, K, KOJIMA, K, TANIOKU, M, YOKOYAMA, K, HAMANAKA, K
Format Journal Article
LanguageEnglish
Published Tokyo Japanese journal of applied physics 01.09.1989
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Abstract As-grown superconducting BiSrCaCuO thin films were grown at 650°C on MgO(100) substrates by RF magnetron sputtering from three targets. The substrate was rotated over the three targets: Bi 3 Sr 2 Ca 2 Cu 3 O x , Bi 2 Sr 3 Ca 3 Cu 3 O x and Bi 2 Sr 2 Ca 2 Cu 4.5 O x . By adjusting the staying time of the substrate over each target, it was possible to precisely control the chemical composition of the thin film. This paper describes the superconducting properties, surface morphology and crystal structures of sputtered films formed by varying the staying time. X-ray diffraction measurement showed that the crystal structure could be changed by varying the staying time. The film with the optimum composition showed zero resistivity at 75 K and had an exceedingly smooth surface. This film had the mixed phase which is considered to be a stacked structure consisting of a high- T c phase and a low- T c phase.
AbstractList As-grown superconducting BiSrCaCuO thin films were grown at 650 deg C on MgO(100) substrates by RF magnetron sputtering from three targets. The substrate was rotated over the three targets: Bi sub 3 Sr sub 2 Ca sub 2 Cu sub 3 O sub x , Bi sub 2 Sr sub 3 Ca sub 3 Cu sub 3 O sub x and Bi sub 2 Sr sub 2 Ca sub 2 Cu sub 4.5 O sub x . By adjusting the staying time of the substrate over each target, it was possible to precisely control the chemical composition of the thin film. The paper describes the superconducting properties, surface morphology and crystal structures of sputtered films formed by varying the staying time. X ray diffraction measurement showed that the crystal structure could be changed by varying the staying time. The film with the optimum composition showed zero resistivity at 75K and had an exceedingly smooth surface. This film had the mixed phase which is considered to be a stacked structure consisting of a high-T sub c phase and a low-T sub c phase. 15 ref.--AA
As-grown superconducting BiSrCaCuO thin films were grown at 650°C on MgO(100) substrates by RF magnetron sputtering from three targets. The substrate was rotated over the three targets: Bi 3 Sr 2 Ca 2 Cu 3 O x , Bi 2 Sr 3 Ca 3 Cu 3 O x and Bi 2 Sr 2 Ca 2 Cu 4.5 O x . By adjusting the staying time of the substrate over each target, it was possible to precisely control the chemical composition of the thin film. This paper describes the superconducting properties, surface morphology and crystal structures of sputtered films formed by varying the staying time. X-ray diffraction measurement showed that the crystal structure could be changed by varying the staying time. The film with the optimum composition showed zero resistivity at 75 K and had an exceedingly smooth surface. This film had the mixed phase which is considered to be a stacked structure consisting of a high- T c phase and a low- T c phase.
Author HAMANAKA, K
KURODA, K
TANIOKU, M
KOJIMA, K
YOKOYAMA, K
Author_xml – sequence: 1
  givenname: K
  surname: KURODA
  fullname: KURODA, K
  organization: Mitsubishi Electric corp., Amagasaki Hyogo 661, Japan
– sequence: 2
  givenname: K
  surname: KOJIMA
  fullname: KOJIMA, K
  organization: Mitsubishi Electric corp., Amagasaki Hyogo 661, Japan
– sequence: 3
  givenname: M
  surname: TANIOKU
  fullname: TANIOKU, M
  organization: Mitsubishi Electric corp., Amagasaki Hyogo 661, Japan
– sequence: 4
  givenname: K
  surname: YOKOYAMA
  fullname: YOKOYAMA, K
  organization: Mitsubishi Electric corp., Amagasaki Hyogo 661, Japan
– sequence: 5
  givenname: K
  surname: HAMANAKA
  fullname: HAMANAKA, K
  organization: Mitsubishi Electric corp., Amagasaki Hyogo 661, Japan
BackLink http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19582214$$DView record in Pascal Francis
BookMark eNpFkEFP3DAQha0KpC7QW3-AL-2p2caOnThHuioFhEQF9ByNveOQVWKnY0fVHvvPGwRST6M3-r53eGfsJMSAjH0U5VYIVX09HGDeSrMV2tTv2EZUqilUWesTtilLKQrVSvmenaV0WGOtldiwv48LeXDIp0jzcxxjf-QQ9tzRMWUYecq0uLwQJh49h1T0FP8E_m14pB3slnuen4fA_TBOic-EMxDuuT3yhys-QR8wUww8zUvOSEPouac4rQ4h8gzUY04X7NTDmPDD2z1nv66-P-2ui7v7Hze7y7vCyUbnwkFrFDqrsbHCglCmbrSyfm81ACIY4xpfQwu6MqKtwFpj27qpQBoEv37O2efX3pni7wVT7qYhORxHCBiX1EmttK5bs4JfXkFHMSVC3800TEDHTpTdy87d7e3lz06a7mXnFf_01gvJwegJghvSf6fVRsrV-gefzYMb
CODEN JJAPA5
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ContentType Journal Article
Copyright 1991 INIST-CNRS
Copyright_xml – notice: 1991 INIST-CNRS
DBID IQODW
AAYXX
CITATION
7SR
8FD
JG9
DOI 10.1143/jjap.28.1586
DatabaseName Pascal-Francis
CrossRef
Engineered Materials Abstracts
Technology Research Database
Materials Research Database
DatabaseTitle CrossRef
Materials Research Database
Technology Research Database
Engineered Materials Abstracts
DatabaseTitleList Materials Research Database
CrossRef
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
EISSN 1347-4065
EndPage 1592
ExternalDocumentID 10_1143_JJAP_28_1586
19582214
GroupedDBID 4.4
AALHV
ACGFS
ACNCT
AEFHF
AI.
ALMA_UNASSIGNED_HOLDINGS
ATQHT
CEBXE
F5P
IOP
IQODW
IZVLO
KOT
MC8
N5L
QTG
RNS
RW3
SJN
TKC
VH1
AAYXX
CITATION
7SR
8FD
JG9
ID FETCH-LOGICAL-c275t-ca984ecb5e7b1ba1486754bfdb5aaeea88c7f6a9a538193abb8b9673a28eaf193
ISSN 0021-4922
IngestDate Fri Aug 16 01:27:07 EDT 2024
Fri Aug 23 02:27:49 EDT 2024
Thu Nov 24 18:27:59 EST 2022
IsPeerReviewed true
IsScholarly true
Issue 9
Keywords Crystal growth
Superconducting materials
Magnetron
Bismuth Calcium Copper Strontium Oxides Mixed
Radiofrequency sputtering
Thin film
Language English
License CC BY 4.0
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c275t-ca984ecb5e7b1ba1486754bfdb5aaeea88c7f6a9a538193abb8b9673a28eaf193
Notes ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
PQID 25455698
PQPubID 23500
PageCount 7
ParticipantIDs proquest_miscellaneous_25455698
crossref_primary_10_1143_JJAP_28_1586
pascalfrancis_primary_19582214
PublicationCentury 1900
PublicationDate 1989-09-01
PublicationDateYYYYMMDD 1989-09-01
PublicationDate_xml – month: 09
  year: 1989
  text: 1989-09-01
  day: 01
PublicationDecade 1980
PublicationPlace Tokyo
PublicationPlace_xml – name: Tokyo
PublicationTitle Japanese Journal of Applied Physics
PublicationYear 1989
Publisher Japanese journal of applied physics
Publisher_xml – name: Japanese journal of applied physics
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SSID ssj0026541
ssj0026590
ssj0026540
ssj0064762
Score 1.4366179
Snippet As-grown superconducting BiSrCaCuO thin films were grown at 650°C on MgO(100) substrates by RF magnetron sputtering from three targets. The substrate was...
As-grown superconducting BiSrCaCuO thin films were grown at 650 deg C on MgO(100) substrates by RF magnetron sputtering from three targets. The substrate was...
SourceID proquest
crossref
pascalfrancis
SourceType Aggregation Database
Index Database
StartPage 1586
SubjectTerms Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physics
Solid surfaces and solid-solid interfaces
Surface and interface dynamics and vibrations
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Title Surface morphology and crystal structures of as-grown BiSrCaCuO thin films prepared by RF magnetron sputtering from three targets
URI https://search.proquest.com/docview/25455698
Volume 28
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1LbxMxELaiIiQQQlBADY_iA5yiDYnX3scxBKImUbtRmkjtaTXeeKtWykPZ5FBu_Dl-F-P1PlskCpdV7GxWG8_n8Yw98w0hnzzOIycC37JjLiwO_sLSRIBWJLqoGRaSddJE2tMz52TORxfiotH4VYla2u9kO_rxx7yS_5Eq9qFcdZbsP0i2eCh24GeUL15Rwnh9kIzP99sYcGIu1zhaJZlStL1NdiYPZJ-eEKThGpBYV9rnbn29Pt_2ob8P0Oi8XmlmpmWiuQJMLDqao9NBawlXK6V3yVvJJi1lnQZcmlSUrVItE0Ce1ExbXHZ1OcsqGQVkNq7ZPynPjebT4Fuvtsk6DkbD03rXrHc2DMbz2pbtZTAOLnvVGxdwNyQrW00e-Dp5tgH6uL7JXW4ro6Rt7qLfa2pM5FqceRW0-hWV3BU513bWNLX37i8dXFNY3NzAps28dvmrKkP3nZWziGfUjD2M6XrqjxgqPK1ph8GkcPwdoQl1yka30vCLbxzuOhm5vfnLeZ4Gt79UX6tmQT3bQIKTOTZVWO4ZFKmVNHtBnmfuDe0ZrL4kDbU6JE8rpJeH5PHEjP4r8jPDLy3xSxG_NMMvLfFL1zHN8UsL_FKNX5ril-b4pfKWTge0wC8t8Us1fmmKX5rh9zWZD77P-idWVhLEipgrdhZqFY-rSArlyq6EruaLFFzGCykAlALPi9zYAR-E3omwQUpP-o5rA_MUxNjzhhys1it1RKjoxHaHKRc9FsEXjIPrS1ydgDs-U4JFTfI5H-ZwY5hfQpPFb4ejUW8SMi_U4miS45oMypszUDTJx1woIepufSCH-F_vk5Ch-yIc33v7t0e8I0_KifSeHODwqw9oDO_kcYq0319Otxk
link.rule.ids 315,783,787,27936,27937
linkProvider IOP Publishing
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Surface+morphology+and+crystal+structures+of+as-grown+BiSrCaCuO+thin+films+prepared+by+RF+magnetron+sputtering+from+three+targets&rft.jtitle=Japanese+journal+of+applied+physics&rft.au=KURODA%2C+K&rft.au=KOJIMA%2C+K&rft.au=TANIOKU%2C+M&rft.au=YOKOYAMA%2C+K&rft.date=1989-09-01&rft.pub=Japanese+journal+of+applied+physics&rft.issn=0021-4922&rft.eissn=1347-4065&rft.volume=28&rft.issue=9&rft.spage=1586&rft.epage=1592&rft_id=info:doi/10.1143%2Fjjap.28.1586&rft.externalDBID=n%2Fa&rft.externalDocID=19582214
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0021-4922&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0021-4922&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0021-4922&client=summon