Investigation of the electrical and optical properties of nickel oxide films produced by RF magnetron sputtering method

Nickel oxide (NiO) thin films were deposited by an RF magnetron sputtering process in different atmospheres: one with a mixture of nitrogen and argon, and another with oxygen and argon. The structural, optical and electrical properties of NiO films were investigated using the spectroscopy, atomic-fo...

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Bibliographic Details
Published inJournal of physics. Conference series Vol. 1124; no. 4; pp. 41042 - 41046
Main Authors Aglikov, A, Mozharov, A, Kudryashov, D, Sosnin, D, Vasilev, A, Bolshakov, A, Makarov, S, Mukhin, I
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.12.2018
Subjects
Argon
Atomic force microscopy
Electrical properties
Magnetic properties
Magnetron sputtering
Nickel oxides
Optical properties
Optimization
Oxide coatings
Perovskites
Photovoltaic cells
Solar cells
Temperature
Thin films
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Summary:Nickel oxide (NiO) thin films were deposited by an RF magnetron sputtering process in different atmospheres: one with a mixture of nitrogen and argon, and another with oxygen and argon. The structural, optical and electrical properties of NiO films were investigated using the spectroscopy, atomic-force microscopy and resistivity measurements. The dependencies of the film properties on atmosphere composition were studied. Optimization of the NiO thin film properties was carried out for further fabrication of effective hole transport layers for perovskite solar cells.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1124/4/041042