APA (7th ed.) Citation

Brault, P., Cavarroc-Weimer, M., Fazeli, S., & Froloff, N. (2025). Conventional and high power impulse magnetron sputtering deposition of tantalum nitride films: A molecular dynamics approach. European physical journal. Applied physics, 100, 12. https://doi.org/10.1051/epjap/2025012

Chicago Style (17th ed.) Citation

Brault, Pascal, Marjorie Cavarroc-Weimer, Sara Fazeli, and Nicolas Froloff. "Conventional and High Power Impulse Magnetron Sputtering Deposition of Tantalum Nitride Films: A Molecular Dynamics Approach." European Physical Journal. Applied Physics 100 (2025): 12. https://doi.org/10.1051/epjap/2025012.

MLA (9th ed.) Citation

Brault, Pascal, et al. "Conventional and High Power Impulse Magnetron Sputtering Deposition of Tantalum Nitride Films: A Molecular Dynamics Approach." European Physical Journal. Applied Physics, vol. 100, 2025, p. 12, https://doi.org/10.1051/epjap/2025012.