Morphological and electrical evolution of ZnO: Al thin filmsdeposited by RF magnetron sputtering onto glass substrates

In this work, the surface and electrical characteristics ZnO:Al thin films deposited by RF magnetron sputtering onto glass substrates have been investigated. Analysis of surface morphologies revealed two growth stages. In the first stage, up to thicknesses of 100 nm, the films show surface structure...

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Published inMaterials research (São Carlos, São Paulo, Brazil) Vol. 17; no. 6; pp. 1384 - 1390
Main Authors Silva, Érica Pereira da, Chaves, Michel, Durrant, Steven Frederick, Lisboa-Filho, Paulo Noronha, Bortoleto, José Roberto Ribeiro
Format Journal Article
LanguageEnglish
Portuguese
Published ABM, ABC, ABPol 01.12.2014
Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol)
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Abstract In this work, the surface and electrical characteristics ZnO:Al thin films deposited by RF magnetron sputtering onto glass substrates have been investigated. Analysis of surface morphologies revealed two growth stages. In the first stage, up to thicknesses of 100 nm, the films show surface structures with a granular form without preferential orientation. Beyond thicknesses of 100 nm, however, the grain structures increase in size and height, producing a pyramidal form and preferred orientation along the c-axis. The XRD results show that the films have a preferred orientation in the (002) plane. Furthermore, with the evolution of the film thickness the electrical resistivity decreases to a minimum of 1.6 x 10 super(-3) [omega]cm for the film of 465 nm thickness. The doping with aluminum atoms produces an increase in concentration of charge carriers to around 8.8 x 10 super(19) cm super(- 3). All films exhibit high optical transmittance (above 85%) in the visible region.
AbstractList In this work, the surface and electrical characteristics ZnO:Al thin films deposited by RF magnetron sputtering onto glass substrates have been investigated. Analysis of surface morphologies revealed two growth stages. In the first stage, up to thicknesses of 100 nm, the films show surface structures with a granular form without preferential orientation. Beyond thicknesses of 100 nm, however, the grain structures increase in size and height, producing a pyramidal form and preferred orientation along the c-axis. The XRD results show that the films have a preferred orientation in the (002) plane. Furthermore, with the evolution of the film thickness the electrical resistivity decreases to a minimum of 1.6 x 10 super(-3) [omega]cm for the film of 465 nm thickness. The doping with aluminum atoms produces an increase in concentration of charge carriers to around 8.8 x 10 super(19) cm super(- 3). All films exhibit high optical transmittance (above 85%) in the visible region.
In this work, the surface and electrical characteristics ZnO:Al thin films deposited by RF magnetron sputtering onto glass substrates have been investigated. Analysis of surface morphologies revealed two growth stages. In the first stage, up to thicknesses of 100 nm, the films show surface structures with a granular form without preferential orientation. Beyond thicknesses of 100 nm, however, the grain structures increase in size and height, producing a pyramidal form and preferred orientation along the c-axis. The XRD results show that the films have a preferred orientation in the (002) plane. Furthermore, with the evolution of the film thickness the electrical resistivity decreases to a minimum of 1.6 × 10- 3 Ω cm for the film of 465 nm thickness. The doping with aluminum atoms produces an increase in concentration of charge carriers to around 8.8 × 10(19) cm- 3. All films exhibit high optical transmittance (above 85%) in the visible region.
Author Chaves, Michel
Silva, Érica Pereira da
Lisboa-Filho, Paulo Noronha
Durrant, Steven Frederick
Bortoleto, José Roberto Ribeiro
AuthorAffiliation Universidade Estadual Paulista
AuthorAffiliation_xml – name: Universidade Estadual Paulista
Author_xml – sequence: 1
  givenname: Érica Pereira da
  surname: Silva
  fullname: Silva, Érica Pereira da
  organization: São Paulo State University, Brazil
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  givenname: Michel
  surname: Chaves
  fullname: Chaves, Michel
  organization: São Paulo State University, Brazil
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  givenname: Steven Frederick
  surname: Durrant
  fullname: Durrant, Steven Frederick
  organization: São Paulo State University, Brazil
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  givenname: Paulo Noronha
  surname: Lisboa-Filho
  fullname: Lisboa-Filho, Paulo Noronha
  organization: São Paulo State University, Brazil
– sequence: 5
  givenname: José Roberto Ribeiro
  surname: Bortoleto
  fullname: Bortoleto, José Roberto Ribeiro
  organization: São Paulo State University, Brazil
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Issue 6
Keywords RF magnetron sputtering
optical transmittance
surface morphology
ZnO:Al
electrical resistivity
Language English
Portuguese
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Snippet In this work, the surface and electrical characteristics ZnO:Al thin films deposited by RF magnetron sputtering onto glass substrates have been investigated....
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SubjectTerms Aluminum
Doping
electrical resistivity
ENGINEERING, CHEMICAL
Evolution
Glass
Magnetron sputtering
MATERIALS SCIENCE, MULTIDISCIPLINARY
METALLURGY & METALLURGICAL ENGINEERING
optical transmittance
Preferred orientation
RF magnetron sputtering
Substrates
surface morphology
Zinc oxide
ZnO:Al
Title Morphological and electrical evolution of ZnO: Al thin filmsdeposited by RF magnetron sputtering onto glass substrates
URI https://search.proquest.com/docview/1808117935
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https://doaj.org/article/b87feec0f18e4c258fe2c103c602d6ca
Volume 17
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