Microstructural evolution of metallorganic derived Pt-doped TiO2

A metalorganic precursor containing Ti and Pt was synthesized using Ti alkoxide derivative, amino acid, and platinum salt. The decomposition behavior of the precursor and thin-film formation were examined in terms of microstructure evolution and crystallization. The precursor yielded anatase at 400...

Full description

Saved in:
Bibliographic Details
Published inJournal of materials research Vol. 15; no. 12; pp. 2794 - 2799
Main Authors Hayakawa, Issei, Iwamoto, Yuji, Kikuta, Ko-ichi, Hirano, Shin-ichi
Format Journal Article
LanguageEnglish
Published New York, USA Cambridge University Press 01.12.2000
Online AccessGet full text

Cover

Loading…
Abstract A metalorganic precursor containing Ti and Pt was synthesized using Ti alkoxide derivative, amino acid, and platinum salt. The decomposition behavior of the precursor and thin-film formation were examined in terms of microstructure evolution and crystallization. The precursor yielded anatase at 400 °C. Grain growth of platinum particles and TiO2 grains was suppressed even at 800 °C in the films. Suppression of grain growth was attributed to an effect of film thickness.
AbstractList A metalorganic precursor containing Ti and Pt was synthesized using Ti alkoxide derivative, amino acid, and platinum salt. The decomposition behavior of the precursor and thin-film formation were examined in terms of microstructure evolution and crystallization. The precursor yielded anatase at 400 °C. Grain growth of platinum particles and TiO2 grains was suppressed even at 800 °C in the films. Suppression of grain growth was attributed to an effect of film thickness.
A metallorganic precursor containing Ti and Pt was synthesised using Ti alkoxide derivative, amino acid and platinum salt. The decomposition behaviour of the precursor and thin-film formation were examined in terms of microstructural evolution and crystallisation. The precursor yielded anatase at 400 C. Grain growth of platinum particles and TiO2 grains was suppressed in the films, even at 800 C. Suppression of grain growth was attributed to the effect of film thickness. 13 refs.
Author Kikuta, Ko-ichi
Hayakawa, Issei
Hirano, Shin-ichi
Iwamoto, Yuji
Author_xml – sequence: 1
  givenname: Issei
  surname: Hayakawa
  fullname: Hayakawa, Issei
  organization: Fine Ceramics Research Association, Synergy Ceramics Laboratory, 2–4-1, Mutsuno, Atsutaku, Nagoya, 456–8587, Japan
– sequence: 2
  givenname: Yuji
  surname: Iwamoto
  fullname: Iwamoto, Yuji
  organization: Fine Ceramics Research Association, Synergy Ceramics Laboratory, 2–4-1, Mutsuno, Atsutaku, Nagoya, 456–8587, Japan
– sequence: 3
  givenname: Ko-ichi
  surname: Kikuta
  fullname: Kikuta, Ko-ichi
  organization: Graduate School of Engineering, Nagoya University, Nagoya 464–8603, Japan
– sequence: 4
  givenname: Shin-ichi
  surname: Hirano
  fullname: Hirano, Shin-ichi
  organization: Graduate School of Engineering, Nagoya University, Nagoya 464–8603, Japan
BookMark eNotkM9PwjAcxRuDiYAeve_kbdCf63bTgIIGghI8N133HSluK3Yd0f_eETy9d_jkJe8zQoPGNYDQPcETIoScvq23E4oxnmCWZVdoSDHnsWA0GaAhTlMe04zwGzRq2wPGRGDJh-hxbY13bfCdCZ3XVQQnV3XBuiZyZVRD0FXl_F431kQFeHuCInoPceGOfdnZDb1F16WuWrj7zzH6fHnezZbxarN4nT2tYkMTGmJeykRIWeLCAOYgCSeGgUg1o6XJocwyTkRqQIDMsWaM8oIbRnOdJYXJRMHG6OGye_Tuu4M2qNq2BqpKN-C6VlEpUpKwpAfjC2jbAD_q6G2t_a_S_kslkkmhksWHWtJUsN18q-Y9P73wRte5t8Ue1MF1vunPKILV2azqzaqzWXU2y_4Anmpsfw
ContentType Journal Article
Copyright Copyright © Materials Research Society 2000
Copyright_xml – notice: Copyright © Materials Research Society 2000
DBID BSCLL
7QQ
8FD
JG9
DOI 10.1557/JMR.2000.0399
DatabaseName Istex
Ceramic Abstracts
Technology Research Database
Materials Research Database
DatabaseTitle Materials Research Database
Technology Research Database
Ceramic Abstracts
DatabaseTitleList
Materials Research Database
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
EISSN 2044-5326
Editor WCA
Editor_xml – fullname: WCA
EndPage 2799
ExternalDocumentID ark_67375_6GQ_H2853TDR_D
10_1557_JMR_2000_0399
GroupedDBID -2P
-2V
-E.
-~X
.DC
.FH
0E1
0R~
2JN
3V.
4.4
406
5GY
5VS
74X
74Y
7WY
7~V
8FE
8FG
8FL
8UJ
8WZ
A6W
AAAZR
AABES
AABWE
AABYN
AACJH
AAEED
AAEOY
AAFGU
AAGCJ
AAGFV
AAHNG
AAIKC
AAKTX
AAMNW
AARAB
AASVR
AATID
AATNV
AAUKB
AAYFA
ABAKF
ABBXD
ABECU
ABEFU
ABGDZ
ABJCF
ABJNI
ABKAS
ABKKG
ABMQK
ABMWE
ABMYL
ABQTM
ABROB
ABTEG
ABTKH
ABTMW
ABUWG
ABZCX
ABZUI
ACAOD
ACBEA
ACBEK
ACBMC
ACCHT
ACETC
ACGFO
ACGFS
ACHSB
ACIGE
ACIHN
ACIMK
ACIWK
ACQFJ
ACQPF
ACREK
ACTTH
ACUIJ
ACUYZ
ACVWB
ACWGA
ACWMK
ACXSD
ACZBM
ACZOJ
ACZUX
ADCGK
ADFEC
ADGEJ
ADOCW
ADOVH
ADOVT
ADOXG
AEAQA
AEBAK
AEEQQ
AEFTE
AEHGV
AEMSY
AEMTW
AENEX
AENGE
AESKC
AESTI
AEYYC
AFBBN
AFFUJ
AFKQG
AFKRA
AFLOS
AFLVW
AFNRJ
AFUTZ
AGLWM
AGMZJ
AGOOT
AGQEE
AHQXX
AI.
AIGIU
AIGNW
AIHIV
AIOIP
AISIE
AJCYY
AJDOV
AJGSW
AJPFC
AJQAS
AKZCZ
ALMA_UNASSIGNED_HOLDINGS
ALVPG
ALWZO
AMTXH
AMXSW
AMYLF
ARABE
ARZZG
ATUCA
AUXHV
AYIQA
BBLKV
BCGOX
BENPR
BESQT
BEZIV
BGHMG
BGLVJ
BJBOZ
BMAJL
BPHCQ
BQFHP
C0O
CBIIA
CCPQU
CCUQV
CFAFE
CFBFF
CGQII
CS3
CZ9
D1I
DC4
DOHLZ
DPUIP
DU5
DWQXO
EBS
EJD
F5P
FIGPU
FRNLG
G8K
GROUPED_ABI_INFORM_COMPLETE
HCIFZ
HG-
HST
HZ~
I.6
I.7
I.9
IH6
IKXTQ
IOEEP
IOO
IS6
IWAJR
I~P
J36
J38
J3A
JHPGK
JKPOH
JQKCU
JZLTJ
K60
K6~
KAFGG
KB.
KC.
KCGVB
KFECR
L98
LHUNA
LLZTM
M-V
M0C
M7~
M8.
NIKVX
NPVJJ
NQJWS
O9-
P2P
PDBOC
PQBIZ
PQQKQ
PROAC
PYCCK
RAMDC
RCA
RNS
RR0
RSV
S0W
S6-
S6U
SAAAG
SCG
SCLPG
SJN
SNE
SNPRN
SOHCF
SOJ
SRMVM
SSLCW
T9M
TAE
TN5
TWZ
UPT
UT1
VH1
VOH
WH7
WQ3
WXU
WXY
YQT
Z7R
Z7S
Z7V
Z7W
Z7X
Z7Y
Z83
Z88
ZDLDU
ZE2
ZJOSE
ZMEZD
ZMTXR
ZYDXJ
~02
~V1
BSCLL
CHEAL
7QQ
8FD
AAJBT
AEFQL
EBLON
JG9
ID FETCH-LOGICAL-c262t-4f76577f0dce04e7141c3e58a32fcbef994158ce5e7b0a3324d4c32ba96dc95d3
ISSN 0884-2914
IngestDate Sat Aug 17 02:34:59 EDT 2024
Wed Jan 17 04:49:01 EST 2024
Wed Mar 13 05:53:24 EDT 2024
IsPeerReviewed true
IsScholarly true
Issue 12
Language English
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c262t-4f76577f0dce04e7141c3e58a32fcbef994158ce5e7b0a3324d4c32ba96dc95d3
Notes Material Research Laboratory, Corporate Tech- nical Center, NGK Insulators, Ltd., Nagoya, Japan.
istex:98F55CA96AC3A3332E4A7DCAD6DDBFBD0A16AA2D
ark:/67375/6GQ-H2853TDR-D
ArticleID:05712
PII:S0884291400057125
ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
PQID 27581636
PQPubID 23500
PageCount 6
ParticipantIDs proquest_miscellaneous_27581636
istex_primary_ark_67375_6GQ_H2853TDR_D
cambridge_journals_10_1557_JMR_2000_0399
PublicationCentury 2000
PublicationDate 2000-12-01
PublicationDateYYYYMMDD 2000-12-01
PublicationDate_xml – month: 12
  year: 2000
  text: 2000-12-01
  day: 01
PublicationDecade 2000
PublicationPlace New York, USA
PublicationPlace_xml – name: New York, USA
PublicationTitle Journal of materials research
PublicationTitleAlternate J. Mater. Res
PublicationYear 2000
Publisher Cambridge University Press
Publisher_xml – name: Cambridge University Press
SSID ssj0015074
Score 1.6639249
Snippet A metalorganic precursor containing Ti and Pt was synthesized using Ti alkoxide derivative, amino acid, and platinum salt. The decomposition behavior of the...
A metallorganic precursor containing Ti and Pt was synthesised using Ti alkoxide derivative, amino acid and platinum salt. The decomposition behaviour of the...
SourceID proquest
istex
cambridge
SourceType Aggregation Database
Publisher
StartPage 2794
Title Microstructural evolution of metallorganic derived Pt-doped TiO2
URI https://www.cambridge.org/core/product/identifier/S0884291400057125/type/journal_article
https://api.istex.fr/ark:/67375/6GQ-H2853TDR-D/fulltext.pdf
https://search.proquest.com/docview/27581636
Volume 15
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1tb9MwELbKJiT4gGCAKK_5gBDSlJI4dtx828YYZVMHjE7aPlmO46ihUjKRdG__hf_K2U7TtHTSQJGixIkS5-6J_Zx9d0bobcokbEovQEzAQOlT4vbBCnB94SepSBihZmhgeBgOjsn-CT3pdH63vJamVdyT1yvjSv5Hq1AGetVRsv-g2eahUADHoF_Yg4ZhfysdD7U3nc0Aa7JnqPP6dXbWvNKT6ibWUm4mUJ9zIJffKjcpzuBglH3FNzBTILG29pt1KqDxvJ26EhNxYQjnl7JUWYOsCwE6N8Oup9OfTfFBNplaenpQuJkcNxcGGfSR5vYf4yyfX5qNPyz7cqwMLWu7j9iWjLg4stGiPWXKsEeISwMbLt80xbQNOdxuWFlEWp00nEYrOwBqVi3eHx6ZGKSeF9j7FhNtL3WAjVui-DXRfm6M8vDzdz7AQGVGu0d89w5ahxdSsO3Xt_d2dg6baSog08SaKfb76iSuUIkPC1VoJ-4AK0j_wJd_df6G0Yweoge1wp1ti6tHqKPyDXS_laByA901DsKyfIy2lrDmNFhzitRZwJpTY82ZYc3RWHuCjvc-jT4O3Hr1DVfiEFcuSVlIGUu9RCqPKOYTXwaK9kWAUxmrNIqA-_WloorFngiAmCdEBjgWUZjIiCbBU7SWF7l6hhyShsBMse_LhJCUKBH72hCmYRwqn7Goi9434uH1_1VybZ6CJDlIUi-W6nEtyS56Z6THz2wyFn6TzrrozUy8HFpMPQ0mclVMS47BRAYrJHx-20e9QPfmwH-J1kDU6hVQ0Sp-XQPiDybEiVU
link.rule.ids 315,786,790,27957,27958
linkProvider Library Specific Holdings
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Microstructural+evolution+of+metallorganic+derived+Pt-doped+TiO2&rft.jtitle=Journal+of+materials+research&rft.au=Hayakawa%2C+Issei&rft.au=Iwamoto%2C+Yuji&rft.au=Kikuta%2C+Ko-ichi&rft.au=Hirano%2C+Shin-ichi&rft.date=2000-12-01&rft.pub=Cambridge+University+Press&rft.issn=0884-2914&rft.eissn=2044-5326&rft.volume=15&rft.issue=12&rft.spage=2794&rft.epage=2799&rft_id=info:doi/10.1557%2FJMR.2000.0399&rft.externalDBID=n%2Fa&rft.externalDocID=ark_67375_6GQ_H2853TDR_D
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0884-2914&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0884-2914&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0884-2914&client=summon