Efficient and Low-Cost Metal Revision Techniques for Post Silicon Repair

• Published in: Journal of semiconductor technology and science Vol. 14; no. 3; pp. 322 - 330
• Main Authors: Lee, Sungchul, Shin, Hyunchul
• Format: Journal Article
• Language: English
• Published: 대한전자공학회 01.06.2014
• Subjects: 전기공학; post-silicon; partition; pin extension; Repair; revision

New effective techniques to repair “small” design errors in integrated circuits are presented. As semiconductor chip complexity increases and the design period becomes tight, errors frequently remain in a fabricated chip making revisions required. Full mask revision significantly increases the cost...