Process Investigations of Total-Dose Hard, Type-108 OP Amps
Analyses and process investigations of a 108 op amp fabrication sequence have been conducted. The analysis was initiated with a total dose characterization of 108 op amps that indicated that total-dose sensitive commercial devices could be radiation hardened by modifying their standard processing. S...
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Published in | IEEE transactions on nuclear science Vol. 23; no. 6; pp. 1756 - 1761 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
IEEE
01.01.1976
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Subjects | |
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Abstract | Analyses and process investigations of a 108 op amp fabrication sequence have been conducted. The analysis was initiated with a total dose characterization of 108 op amps that indicated that total-dose sensitive commercial devices could be radiation hardened by modifying their standard processing. Subsequent failure analysis identified the critical op amp failure modes as primarily the result of superbetagain loss and leakage increase. A process-flow analysis with MOS capacitors on the selected baseline fabrication sequence was followed by a study of specific processing steps on the radiation performance of 108 op amps. Amplifiers, transistor test devices and MOS capacitors were evaluated. Emphasis was placed on processing steps near the end of the process sequence. Using the defined process it was possible to fabricate 108 devices with minimal degradation at 106 rads(Si). Some relaxation of initial 108A performance is required for the hard devices. |
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AbstractList | Analyses and process investigations of a 108 op amp fabrication sequence have been conducted. The analysis was initiated with a total dose characterization of 108 op amps that indicated that total-dose sensitive commercial devices could be radiation hardened by modifying their standard processing. Subsequent failure analysis identified the critical op amp failure modes as primarily the result of superbetagain loss and leakage increase. A process-flow analysis with MOS capacitors on the selected baseline fabrication sequence was followed by a study of specific processing steps on the radiation performance of 108 op amps. Amplifiers, transistor test devices and MOS capacitors were evaluated. Emphasis was placed on processing steps near the end of the process sequence. Using the defined process it was possible to fabricate 108 devices with minimal degradation at 106 rads(Si). Some relaxation of initial 108A performance is required for the hard devices. |
Author | Greegor, Robert B. Palkuti, Leslie J. Sivo, Louis L. |
Author_xml | – sequence: 1 givenname: Leslie J. surname: Palkuti fullname: Palkuti, Leslie J. organization: Naval Research Laboratory Washington, D. C. 20375 – sequence: 2 givenname: Louis L. surname: Sivo fullname: Sivo, Louis L. organization: Boeing Aerospace Company Seattle, Washington 98124 – sequence: 3 givenname: Robert B. surname: Greegor fullname: Greegor, Robert B. organization: Boeing Aerospace Company Seattle, Washington 98124 |
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CitedBy_id | crossref_primary_10_1109_TNS_1977_4329168 crossref_primary_10_1109_TNS_1987_4337502 crossref_primary_10_1109_TNS_2013_2244615 crossref_primary_10_1109_23_819131 crossref_primary_10_1109_TNS_1977_4329166 crossref_primary_10_1109_TNS_1977_4329165 crossref_primary_10_1109_TNS_2011_2128885 crossref_primary_10_1109_TNS_2003_813133 crossref_primary_10_1109_TNS_2017_2780827 |
Cites_doi | 10.1109/TNS.1973.4327023 10.1109/TNS.1972.4326842 10.1016/0038-1101(70)90073-0 10.1109/TNS.1975.4328096 10.1149/1.2132873 10.1016/0038-1101(67)90017-2 |
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References | ref7 ref3a crabbe (ref4b) 1975 castagne (ref6b) 1968; 267 aubuchon (ref3b) 1974; ns 21 ref3c ref5 palkuti (ref1) 1968; 1 sah (ref4a) 1976 ref2 ref6a |
References_xml | – ident: ref2 doi: 10.1109/TNS.1973.4327023 – volume: 267 start-page: 866 year: 1968 ident: ref6b publication-title: C R Seances de l Acad des Sci Paris contributor: fullname: castagne – year: 1975 ident: ref4b publication-title: Application of MOS Hardening Techniques to Bipolar Device Processing contributor: fullname: crabbe – year: 1976 ident: ref4a publication-title: Origins of Interface States and Oxide Charges Generated by Ionizing Radiation in Metal-Oxide-Silicon Structures contributor: fullname: sah – volume: ns 21 start-page: 167 year: 1974 ident: ref3b article-title: Effects of HC1 Gettering, Cr Doping and A1+ Implantation on Hardened SiO2 publication-title: IEEE Trans contributor: fullname: aubuchon – volume: 1 start-page: 202 year: 1968 ident: ref1 article-title: Effects of Space Radiation on Silicon Microcircuits publication-title: Digest of technical papers contributor: fullname: palkuti – ident: ref3a doi: 10.1109/TNS.1972.4326842 – ident: ref6a doi: 10.1016/0038-1101(70)90073-0 – ident: ref3c doi: 10.1109/TNS.1975.4328096 – ident: ref5 doi: 10.1149/1.2132873 – ident: ref7 doi: 10.1016/0038-1101(67)90017-2 |
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Snippet | Analyses and process investigations of a 108 op amp fabrication sequence have been conducted. The analysis was initiated with a total dose characterization of... |
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SubjectTerms | Circuits Degradation Fabrication Ionization Ionizing radiation MOS capacitors Operational amplifiers Radiation hardening Sequences Testing |
Title | Process Investigations of Total-Dose Hard, Type-108 OP Amps |
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