Mid-wavelength infrared focal plane array based on type II InAs/GaSb superlattices on InP substrate

•Mid-wavelength infrared photodetectors based on type II InAs/GaSb superlattice structures grown on InP substrate.•Suppression of propagation of threading dislocations because of thick GaSb buffer layer and two step growth of it.•Successful fabrication of 640 × 512 format 2D arrays with 15 μm-pixel...

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Published inInfrared physics & technology Vol. 137; p. 105133
Main Authors Sato, Masaki, Inada, Hiroshi, Obi, Hiroshi, Mori, Hiroki, Fuyuki, Takuma, Balasekaran, Sundararajan, Kimura, Daisuke, Machinaga, Kenichi, Iguchi, Yasuhiro, Muramatsu, Yasuhiro, Murofushi, Hiroshi, Sano, Masahiko, Kudo, Junichi, Kibe, Michiya, Koyama, Masatoshi
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LanguageEnglish
Published Elsevier B.V 01.03.2024
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Abstract •Mid-wavelength infrared photodetectors based on type II InAs/GaSb superlattice structures grown on InP substrate.•Suppression of propagation of threading dislocations because of thick GaSb buffer layer and two step growth of it.•Successful fabrication of 640 × 512 format 2D arrays with 15 μm-pixel pitch.•Clear Human face image with high operability under cooled operation. We report the growth and characterization of band gap engineered mid-wavelength infrared photodiode, pBiBn, based on type-II InAs/GaSb superlattices on InP substrate. InP substrates are attractive material because they have high transmittance in the mid-wavelength infrared region and near thermal expansion coefficient to Si read-out IC (ROIC). Misfit dislocations due to lattice mismatch between GaSb and InP were successfully suppressed by thick GaSb buffer layer and two step growth of it. The photoluminescence (PL) spectrum from the absorption layers exhibits a peak wavelength of 5.01 μm at 77 K. The distinct PL peak was observed even at 120 K, indicating the excellent crystalline quality of T2SLs grown on an InP substrate. The dark current densities of 292 × 10−6 A/cm2 at 77 K and cut off wavelength of 5.15 μm at 80 K were measured, respectively. A clear image was obtained by fabricated focal plane array of 640 × 512 pixels with 15 μm pixel pitch, and NEDT and defective pixel rate was 50 mK and less than 1 % at 100 K, respectively.
AbstractList •Mid-wavelength infrared photodetectors based on type II InAs/GaSb superlattice structures grown on InP substrate.•Suppression of propagation of threading dislocations because of thick GaSb buffer layer and two step growth of it.•Successful fabrication of 640 × 512 format 2D arrays with 15 μm-pixel pitch.•Clear Human face image with high operability under cooled operation. We report the growth and characterization of band gap engineered mid-wavelength infrared photodiode, pBiBn, based on type-II InAs/GaSb superlattices on InP substrate. InP substrates are attractive material because they have high transmittance in the mid-wavelength infrared region and near thermal expansion coefficient to Si read-out IC (ROIC). Misfit dislocations due to lattice mismatch between GaSb and InP were successfully suppressed by thick GaSb buffer layer and two step growth of it. The photoluminescence (PL) spectrum from the absorption layers exhibits a peak wavelength of 5.01 μm at 77 K. The distinct PL peak was observed even at 120 K, indicating the excellent crystalline quality of T2SLs grown on an InP substrate. The dark current densities of 292 × 10−6 A/cm2 at 77 K and cut off wavelength of 5.15 μm at 80 K were measured, respectively. A clear image was obtained by fabricated focal plane array of 640 × 512 pixels with 15 μm pixel pitch, and NEDT and defective pixel rate was 50 mK and less than 1 % at 100 K, respectively.
ArticleNumber 105133
Author Obi, Hiroshi
Murofushi, Hiroshi
Kibe, Michiya
Kimura, Daisuke
Kudo, Junichi
Muramatsu, Yasuhiro
Koyama, Masatoshi
Fuyuki, Takuma
Machinaga, Kenichi
Mori, Hiroki
Balasekaran, Sundararajan
Iguchi, Yasuhiro
Inada, Hiroshi
Sato, Masaki
Sano, Masahiko
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  givenname: Masaki
  surname: Sato
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  givenname: Hiroshi
  surname: Inada
  fullname: Inada, Hiroshi
  organization: Sumitomo Electric Industries, Yokohama, Kanagawa 244-8588, Japan
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  surname: Machinaga
  fullname: Machinaga, Kenichi
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  givenname: Yasuhiro
  surname: Iguchi
  fullname: Iguchi, Yasuhiro
  organization: Sumitomo Electric Industries, Yokohama, Kanagawa 244-8588, Japan
– sequence: 10
  givenname: Yasuhiro
  surname: Muramatsu
  fullname: Muramatsu, Yasuhiro
  organization: NEC Corporation, Fuchu, Tokyo 183-8501, Japan
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  givenname: Hiroshi
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  fullname: Murofushi, Hiroshi
  organization: NEC Corporation, Fuchu, Tokyo 183-8501, Japan
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  givenname: Masahiko
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  fullname: Sano, Masahiko
  organization: NEC Corporation, Fuchu, Tokyo 183-8501, Japan
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  givenname: Junichi
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  fullname: Kibe, Michiya
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  givenname: Masatoshi
  surname: Koyama
  fullname: Koyama, Masatoshi
  organization: Acquisition, Technology & Logistics Agency, Future Capabilities Development Center, Shinjuku, Tokyo 162-8801, Japan
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Keywords Type-II InAs/GaSb superlattices
MBE
InP substrate
Focal plane array
Infrared detector
Language English
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Snippet •Mid-wavelength infrared photodetectors based on type II InAs/GaSb superlattice structures grown on InP substrate.•Suppression of propagation of threading...
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StartPage 105133
SubjectTerms Focal plane array
Infrared detector
InP substrate
MBE
Type-II InAs/GaSb superlattices
Title Mid-wavelength infrared focal plane array based on type II InAs/GaSb superlattices on InP substrate
URI https://dx.doi.org/10.1016/j.infrared.2024.105133
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