Azizimanesh, A., Peña, T., Sewaket, A., Hou, W., & Wu, S. M. (2021). Uniaxial and biaxial strain engineering in 2D MoS2 with lithographically patterned thin film stressors. Applied physics letters, 118(21), . https://doi.org/10.1063/5.0049446
Chicago Style (17th ed.) CitationAzizimanesh, Ahmad, Tara Peña, Arfan Sewaket, Wenhui Hou, and Stephen M. Wu. "Uniaxial and Biaxial Strain Engineering in 2D MoS2 with Lithographically Patterned Thin Film Stressors." Applied Physics Letters 118, no. 21 (2021). https://doi.org/10.1063/5.0049446.
MLA (9th ed.) CitationAzizimanesh, Ahmad, et al. "Uniaxial and Biaxial Strain Engineering in 2D MoS2 with Lithographically Patterned Thin Film Stressors." Applied Physics Letters, vol. 118, no. 21, 2021, https://doi.org/10.1063/5.0049446.