A new process for depositing tungsten nitride thin films

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 145; no. 2; pp. L21 - L23
Main Authors LU, J. P, HSU, W. Y, LUTTMER, J. D, MAGEL, L. K, TSAI, H. L
Format Journal Article
LanguageEnglish
Published Pennington, NJ Electrochemical Society 01.02.1998
Subjects
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Stoichiometry
RBS
Inorganic compounds
Stability
Transition element compounds
Purity
Tungsten nitrides
Binary compounds
Crystal growth from vapors
Experimental study
Photoelectron spectroscopy
Thin films
X radiation
SEM
PECVD
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More Information
ISSN:0013-4651
1945-7111
DOI:10.1149/1.1838267