The effects of moisture on strain relief of Si-O bonds in plasma-enhanced chemical vapor deposited silicon dioxide films
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Published in | Journal of the Electrochemical Society Vol. 144; no. 9; pp. 3265 - 3270 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Pennington, NJ
Electrochemical Society
01.09.1997
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Subjects | |
Online Access | Get full text |
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ISSN: | 0013-4651 1945-7111 |
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DOI: | 10.1149/1.1837995 |