Correlation between X-ray micro-diffraction and a developed analytical model to measure the residual stresses in suspended structures in MEMS
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Published in | Microelectronics and reliability Vol. 43; no. 9; pp. 1963 - 1968 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier Ltd
01.09.2003
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Online Access | Get full text |
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