Physical feature exploration of nanocrystalline FeSi2 surface with argon plasma etching under varying power

• Published in: Vacuum Vol. 218; p. 112588
• Main Authors: Borwornpornmetee, Nattakorn, Sittimart, Phongsaphak, Phatthanakun, Rungrueang, Nakajima, Hideki, Paosawatyanyong, Boonchoat, Yoshitake, Tsuyoshi, Promros, Nathaporn
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.12.2023
• Subjects: Argon plasma etching; Nanocrystalline FeSi2; Surface modification; Wettability; Nanocrystalline FeSi2; Surface modification; Argon plasma etching; Wettability

Nanocrystalline (NC) FeSi2 films were created on Si(111) wafers via direct-current sputtering with facing targets at an ambient temperature, then the films were etched by Ar plasma generated through microwave source at different powers of 50, 100, and 150 W. The surface morphology of the as-coated N...