Investigating the influence of RF power on the surface morphological and optical properties of sputtered TiO2 thin films

• Published in: Optical materials Vol. 157; p. 116363
• Main Authors: Grayeli, Alireza, Ahmadpourian, Azin, Jurečka, Stanislav, Luna, Carlos, Rezaee, Sahar, Karimi, Maryam
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.11.2024
• Subjects: Optical properties; RF sputtering; Swanepoel method; Tauc plot; TiO2 thin film; X-ray diffraction; Swanepoel method; Tauc plot; X-ray diffraction; TiO2 thin film; RF sputtering; Optical properties

Thin films of titanium dioxide (TiO2), with thicknesses ranging from 105 to 231 nm, were deposited on glass substrates using radio-frequency (RF) magnetron sputtering in an argon atmosphere at four distinct RF power levels: 40, 70, 100, and 130 W, with the deposition time kept constant. The crystall...