Tip- and Laser-based 3D Nanofabrication in Extended Macroscopic Working Areas

The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and the resulting financial requirements can only be...

Full description

Saved in:
Bibliographic Details
Published inNanomanufacturing and metrology Vol. 4; no. 3; pp. 132 - 148
Main Authors Ortlepp, Ingo, Fröhlich, Thomas, Füßl, Roland, Reger, Johann, Schäffel, Christoph, Sinzinger, Stefan, Strehle, Steffen, Theska, René, Zentner, Lena, Zöllner, Jens-Peter, Rangelow, Ivo W., Reinhardt, Carsten, Hausotte, Tino, Cao, Xinrui, Dannberg, Oliver, Fern, Florian, Fischer, David, Gorges, Stephan, Hofmann, Martin, Kirchner, Johannes, Meister, Andreas, Sasiuk, Taras, Schienbein, Ralf, Supreeti, Shraddha, Mohr-Weidenfeller, Laura, Weise, Christoph, Reuter, Christoph, Stauffenberg, Jaqueline, Manske, Eberhard
Format Journal Article
LanguageEnglish
Published Singapore Springer Singapore 01.09.2021
Subjects
Online AccessGet full text

Cover

Loading…