Thin Emitter Structure Improved Turn-on Characteristics in RSD

The thin emitter structure was introduced into reversely switched dynistor(RSD) to improve its turn-on characteristics. According to the analysis of turn-on condition, thin emitter structure is capable of reducing the extraction action for the triggering plasma layer P1 during turn-on process, and s...

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Bibliographic Details
Published inTransactions of Tianjin University Vol. 14; no. 3; pp. 182 - 185
Main Author 梁琳 余岳辉 周郁明 王璐
Format Journal Article
LanguageEnglish
Published Heidelberg Tianjin University 01.06.2008
Department of Electronic Science and Technology, Huazhong University of Science and Technology, Wuhan 430074, China
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ISSN1006-4982
1995-8196
DOI10.1007/s12209-008-0033-7

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Summary:The thin emitter structure was introduced into reversely switched dynistor(RSD) to improve its turn-on characteristics. According to the analysis of turn-on condition, thin emitter structure is capable of reducing the extraction action for the triggering plasma layer P1 during turn-on process, and satisfying the requirement that triggering electric charge cannot be exhausted and therefore enables RSD to turn on uniformly. The on-state thin emitter RSD was equivalent to an asymmetric pin diode model. The simulation result shows that the forward voltage drop of RSD falls with the decrease of doping dose in p^+-emitter in a certain range, and when the doping concentration is extremely tow, the decrease of the width of p^+-emitter can obtain a tow forward voltage drop. Thin emitter RSD chips were made by sintering AI on n-Si. The test result shows that their turn-on process is uniform and the voltage drop is 7.5 V when the peak conversion current is 5 500 A.
Bibliography:thin emitter
turn-on characteristics
forward voltage drop
12-1248/T
reversely switched dynistor(RSD)
reversely switched dynistor(RSD); thin emitter; turn-on characteristics; switch; forward voltage drop
TN304
switch
ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1006-4982
1995-8196
DOI:10.1007/s12209-008-0033-7