In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers
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Published in | Journal of vacuum science and technology. B, Nanotechnology & microelectronics Vol. 29; no. 6; p. 6 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
01.11.2011
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Online Access | Get full text |
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Author | Duan, Huigao Harry, Katherine J. Yang, Joel K. W. Strobel, Sebastian Berggren, Karl K. |
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Title | In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers |
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