APA (7th ed.) Citation

Harry, K. J., Strobel, S., Yang, J. K. W., Duan, H., & Berggren, K. K. (2011). In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers. Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 29(6), 6. https://doi.org/10.1116/1.3644339

Chicago Style (17th ed.) Citation

Harry, Katherine J., Sebastian Strobel, Joel K. W. Yang, Huigao Duan, and Karl K. Berggren. "In Situ Study of Hydrogen Silsesquioxane Dissolution Rate in Salty and Electrochemical Developers." Journal of Vacuum Science and Technology. B, Nanotechnology & Microelectronics 29, no. 6 (2011): 6. https://doi.org/10.1116/1.3644339.

MLA (9th ed.) Citation

Harry, Katherine J., et al. "In Situ Study of Hydrogen Silsesquioxane Dissolution Rate in Salty and Electrochemical Developers." Journal of Vacuum Science and Technology. B, Nanotechnology & Microelectronics, vol. 29, no. 6, 2011, p. 6, https://doi.org/10.1116/1.3644339.