CHEN, Y., LUO, J., LEI, W., SHEN, Y., & CAO, S. (2024). Analysis and prediction of sputtering yield using combined hierarchical clustering analysis and artificial neural network algorithms. Plasma science & technology, 26(11), 115504-115511. https://doi.org/10.1088/2058-6272/ad709c
Chicago Style (17th ed.) CitationCHEN, Yu, Jiawei LUO, Wen LEI, Yan SHEN, and Shuai CAO. "Analysis and Prediction of Sputtering Yield Using Combined Hierarchical Clustering Analysis and Artificial Neural Network Algorithms." Plasma Science & Technology 26, no. 11 (2024): 115504-115511. https://doi.org/10.1088/2058-6272/ad709c.
MLA (9th ed.) CitationCHEN, Yu, et al. "Analysis and Prediction of Sputtering Yield Using Combined Hierarchical Clustering Analysis and Artificial Neural Network Algorithms." Plasma Science & Technology, vol. 26, no. 11, 2024, pp. 115504-115511, https://doi.org/10.1088/2058-6272/ad709c.