Effects of Three Typical Resistivity Models on Pulsed Inductive Plasma Acceleration Modeling

The effects of three different typical resistivity models（Spitzer, Z＆L and M＆G） on the performance of pulsed inductive acceleration plasma are studied. Numerical results show that their influences decrease with the increase of the plasma temperature. The significant discriminations among them appear...

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Published inChinese physics letters Vol. 34; no. 12; pp. 46 - 50
Main Author 孙新锋;贾艳辉;张天平;吴宸辰;温晓东;郭宁;金海;柯于俊;郭伟龙
Format Journal Article
LanguageEnglish
Published 01.12.2017
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ISSN0256-307X
1741-3540
DOI10.1088/0256-307X/34/12/125202

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Abstract The effects of three different typical resistivity models（Spitzer, Z＆L and M＆G） on the performance of pulsed inductive acceleration plasma are studied. Numerical results show that their influences decrease with the increase of the plasma temperature. The significant discriminations among them appear at the plasma temperature lower than 2.5 eV, and the maximum gap of the pulsed inductive plasma accelerated efficiency is approximately 2.5%.Moreover, the pulsed inductive plasma accelerated efficiency is absolutely related to the dynamic impedance parameters, such as voltage, inductance, capacitance and flow rate. However, the distribution of the efficiency as a function of plasma temperature with three resistivity models has nothing to do with the dynamic impedance parameter.
AbstractList The effects of three different typical resistivity models（Spitzer, Z＆L and M＆G） on the performance of pulsed inductive acceleration plasma are studied. Numerical results show that their influences decrease with the increase of the plasma temperature. The significant discriminations among them appear at the plasma temperature lower than 2.5 eV, and the maximum gap of the pulsed inductive plasma accelerated efficiency is approximately 2.5%.Moreover, the pulsed inductive plasma accelerated efficiency is absolutely related to the dynamic impedance parameters, such as voltage, inductance, capacitance and flow rate. However, the distribution of the efficiency as a function of plasma temperature with three resistivity models has nothing to do with the dynamic impedance parameter.
Author 孙新锋;贾艳辉;张天平;吴宸辰;温晓东;郭宁;金海;柯于俊;郭伟龙
AuthorAffiliation National Key Laboratory of Science and Technology on Vacuum Technology and Physics, Lanzhou Institute of Physics, Lanzhou 730000;College of Electrical and Information Engineering, Lanzhou University of Technology, Lanzhou 730050
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Notes 11-1959/O4
Xin-Feng Sun, Yan-nui Jia, Tian-Ping Zhang, Chen-Chen Wu, Xiao-Dong Wen, Ning Guo, Hai Jin, Yu-Jun Ke, Wei-Long Guo（1 National Key Laboratory of Science and Technology on Vacuum Technology and Physics, 2 College of Electrical and Lanzhou Institute of Physics, Lanzhou 730000 Information Engineering, Lanzhou University of Technology, Lanzhou 730050）
The effects of three different typical resistivity models（Spitzer, Z＆L and M＆G） on the performance of pulsed inductive acceleration plasma are studied. Numerical results show that their influences decrease with the increase of the plasma temperature. The significant discriminations among them appear at the plasma temperature lower than 2.5 eV, and the maximum gap of the pulsed inductive plasma accelerated efficiency is approximately 2.5%.Moreover, the pulsed inductive plasma accelerated efficiency is absolutely related to the dynamic impedance parameters, such as voltage, inductance, capacitance and flow rate. However, the distribution of the efficiency as a function of plasma temperature with three resistivity models has nothing to do with the dynamic impedance parameter.
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