Observation of a Current Plateau in the Transfer Characteristics of InGaN/AlGaN/AlN/GaN Heterojunction Field Effect Transistors
Direct-current transfer characteristics of (InGaN)/A1GaN/A1N/GaN heterojunction field effect transistors (HFETs) are presented. A drain current plateau (IDs = 32.0 mA/mm) for Vcs swept from +0.7 V to -0. 6 V is present in the transfer characteristics of InGaN/AIGaN/AIN/GaN HFETs. The theoretical cal...
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Published in | Chinese physics letters Vol. 32; no. 12; pp. 113 - 116 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.12.2015
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Subjects | |
Online Access | Get full text |
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Summary: | Direct-current transfer characteristics of (InGaN)/A1GaN/A1N/GaN heterojunction field effect transistors (HFETs) are presented. A drain current plateau (IDs = 32.0 mA/mm) for Vcs swept from +0.7 V to -0. 6 V is present in the transfer characteristics of InGaN/AIGaN/AIN/GaN HFETs. The theoretical calculation shows the coexistence of two-dimensional electron gas (2DEG) and two-dimensional hole gas (2DHG) in InGaN/AIGaN/A1N/GaN heterostructures, and the screening effect of 2DHG to the 2DEG in the conduction channel can explain this current plateau. Moreover, the current plateau shows the time-dependent behavior when IDs Vcs scans repeated are conducted. The obtained insight provides indication for the design in the fabrication of GaN-based super HFETs. |
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Bibliography: | 11-1959/O4 Direct-current transfer characteristics of (InGaN)/A1GaN/A1N/GaN heterojunction field effect transistors (HFETs) are presented. A drain current plateau (IDs = 32.0 mA/mm) for Vcs swept from +0.7 V to -0. 6 V is present in the transfer characteristics of InGaN/AIGaN/AIN/GaN HFETs. The theoretical calculation shows the coexistence of two-dimensional electron gas (2DEG) and two-dimensional hole gas (2DHG) in InGaN/AIGaN/A1N/GaN heterostructures, and the screening effect of 2DHG to the 2DEG in the conduction channel can explain this current plateau. Moreover, the current plateau shows the time-dependent behavior when IDs Vcs scans repeated are conducted. The obtained insight provides indication for the design in the fabrication of GaN-based super HFETs. YAN Jun-Da, WANG Quan, WANG Xiao-Liang, XIAO Hong-Ling, JIANG Li-Juan, YIN Hai-Bo, FENG Chun, WANG Cui-Mei, QU Shen-Qi, GONG Jia-Min, ZHANG Bo, LI Bai-Quan,WANG Zhan-Guo, HOU Xun(1. Key Lab of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083; 2.School of Electronic Engineering, Xi'an University of Posts and Telecommunications, Xi'an 710049 ;3 Beijing Key Laboratory of Low Dimensional Semiconductor Materials and Devices, Beijing 100083 ;4.ISCAS-XJTU Joint Laboratory of Functional Materials and Devices for Informatics, Beijing 100083 ; 5.Beijing Huajin Uhuangwei Technology Co., Ltd., Beijing 100036) |
ISSN: | 0256-307X 1741-3540 |
DOI: | 10.1088/0256-307X/32/12/127301 |