Influence on the sp3/sp2 character of the carbon on the insertion of nitrogen in RFMS carbon nitride films

RFMS carbon nitride films have been elaborated at several substrate temperatures between 150 °C and 450 °C, where they evolve from a highly resistive to highly conductive comportment. Their local structure has been determined from X-ray photoemission, Raman and infrared spectroscopic results. The fi...

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Published inDiamond and related materials Vol. 17; no. 4-5; pp. 700 - 704
Main Authors BOUCHET-FABRE, B, LAZAR, G, BALLUTAUD, D, GODET, C, ZELLAMA, K
Format Conference Proceeding Journal Article
LanguageEnglish
Published Amsterdam Elsevier 01.04.2008
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Abstract RFMS carbon nitride films have been elaborated at several substrate temperatures between 150 °C and 450 °C, where they evolve from a highly resistive to highly conductive comportment. Their local structure has been determined from X-ray photoemission, Raman and infrared spectroscopic results. The films composition has been measured by nuclear reaction analysis and elastic recoil detection. We will correlate the strong modifications of the electronic properties of the films to their well characterized structural changes. We will show how the substrate temperature acts on the incorporation of nitrogen in carboneous RFMS films and which is the resulting consequence on the sp3/sp2 character of the carbon network.
AbstractList RFMS carbon nitride films have been elaborated at several substrate temperatures between 150 °C and 450 °C, where they evolve from a highly resistive to highly conductive comportment. Their local structure has been determined from X-ray photoemission, Raman and infrared spectroscopic results. The films composition has been measured by nuclear reaction analysis and elastic recoil detection. We will correlate the strong modifications of the electronic properties of the films to their well characterized structural changes. We will show how the substrate temperature acts on the incorporation of nitrogen in carboneous RFMS films and which is the resulting consequence on the sp3/sp2 character of the carbon network.
Author BOUCHET-FABRE, B
GODET, C
LAZAR, G
ZELLAMA, K
BALLUTAUD, D
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Keywords Electronic properties
Fourier transform spectroscopy
Phase composition
Raman spectroscopy
Carbon
Carbon nitride
Thin films
Local structure
Electronic structure
FTIR
Physical vapor deposition
Crystal-phase transformations
Carbon nitrides
Raman
XPS
Elastic analysis
X-ray photoelectron spectra
Crystal structure
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Snippet RFMS carbon nitride films have been elaborated at several substrate temperatures between 150 °C and 450 °C, where they evolve from a highly resistive to highly...
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SubjectTerms Catalysis
Chemical Sciences
Composition and phase identification
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science; rheology
Deposition by sputtering
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Exact sciences and technology
Fullerenes and related materials; diamonds, graphite
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Specific materials
Surface and interface electron states
Surface states, band structure, electron density of states
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Thin film structure and morphology
Title Influence on the sp3/sp2 character of the carbon on the insertion of nitrogen in RFMS carbon nitride films
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