Surface morphology and reconstructions of ultra thin Si films grown by solid-phase epitaxy

• Published in: Thin solid films Vol. 294; no. 1; pp. 88 - 92
• Main Authors: Zhang, Z, Kulakov, M.A, Bullemer, B
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 15.02.1997
• Subjects: epitaxy; scanning tunnelling microscopy; silicon; surface morphology; scanning tunnelling microscopy; surface morphology; silicon; epitaxy

Solid-phase epitaxy has been performed on Si(100) and Si(111) surfaces at substrate temperatures in the range of 350–650 °C and for film thickness up to a few monolayers. The features of the epitaxial films were acquired by scanning tunnelling microscopy. Each surface displays a complete epitaxial l...