Thin Teflon-like films for eliminating adhesion in released polysilicon microstructures

This paper presents a method for depositing thin Teflon-like films to eliminate adhesion or suction in released polysilicon microstructures. A commercial plasma reactor is used in direct and remote plasma modes with commercially available trifluoromethane (CHF 3) to deposit thin hydrophobic films ar...

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Bibliographic Details
Published inSensors and actuators. A. Physical. Vol. 70; no. 1; pp. 159 - 163
Main Authors Smith, Bradley K., Sniegowski, Jeffry J., LaVigne, Glenn, Brown, Craig
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.10.1998
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