Thin Teflon-like films for eliminating adhesion in released polysilicon microstructures
This paper presents a method for depositing thin Teflon-like films to eliminate adhesion or suction in released polysilicon microstructures. A commercial plasma reactor is used in direct and remote plasma modes with commercially available trifluoromethane (CHF 3) to deposit thin hydrophobic films ar...
Saved in:
Published in | Sensors and actuators. A. Physical. Vol. 70; no. 1; pp. 159 - 163 |
---|---|
Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
01.10.1998
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!