Laser microfabrication of thin films: Part three

In this paper, the third of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication of a variety of micro and opto-electronics devices — the main mechanisms of laser-induced alloying and dopinh in semiconductors and the etching...

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Bibliographic Details
Published inOptics and laser technology Vol. 19; no. 2; pp. 75 - 82
Main Authors Micheli, F., Boyd, I.W.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 1987
Subjects
etching
integrated circuits
laser processing
lasers
thin films
lasers
laser processing
integrated circuits
etching
thin films
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ISSN0030-3992
1879-2545
DOI10.1016/0030-3992(87)90023-5

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Summary:In this paper, the third of a series of three reviewing the subject of laser microchemical processing — a potentially powerful technique for the fabrication of a variety of micro and opto-electronics devices — the main mechanisms of laser-induced alloying and dopinh in semiconductors and the etching of microstructures in a variety of materials are discussed. Many examples of the application of the laser based processing to integrated circuit repair and customization are presented.
ISSN:0030-3992
1879-2545
DOI:10.1016/0030-3992(87)90023-5