Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film - Futase, Takuya; Tanioto, Hisanori; Kimoto, Mitsuo; Tsugane, Hideaki; Suzuki, Hidenori; Tobimatsu, Hiroshi (Journal of vacuum science and technology. B, Nanotechnology & microelectronics, 2011)