Generation of chemical deposits on fused silica optics and their modulation on the light intensity distribution

• Published in: Applied optics. Optical technology and biomedical optics Vol. 61; no. 36; p. 10669
• Main Authors: Ye, Hui, Cui, Zhuangzhuang, Li, Zhuang, Yang, Wei, Qian, Yuan
• Format: Journal Article
• Language: English
• Published: United States 20.12.2022

Deposited substances generated from hydrofluoric acid based (HF-based) etching are found to be the precursors that deteriorate the resistance of fused silica optics to laser damage. In this paper, the surface of polished fused silica was treated with a buffer oxide etchant (BOE, 5-10%wt. HF + 10%wt....