Generation of chemical deposits on fused silica optics and their modulation on the light intensity distribution

Deposited substances generated from hydrofluoric acid based (HF-based) etching are found to be the precursors that deteriorate the resistance of fused silica optics to laser damage. In this paper, the surface of polished fused silica was treated with a buffer oxide etchant (BOE, 5-10%wt. HF + 10%wt....

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Published inApplied optics. Optical technology and biomedical optics Vol. 61; no. 36; p. 10669
Main Authors Ye, Hui, Cui, Zhuangzhuang, Li, Zhuang, Yang, Wei, Qian, Yuan
Format Journal Article
LanguageEnglish
Published United States 20.12.2022
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Abstract Deposited substances generated from hydrofluoric acid based (HF-based) etching are found to be the precursors that deteriorate the resistance of fused silica optics to laser damage. In this paper, the surface of polished fused silica was treated with a buffer oxide etchant (BOE, 5-10%wt. HF + 10%wt. +80-85 . ). The optic surface area affected by the etching-induced deposits ( ) was found to increase significantly with the amount of material removal and sensitivity to the post-cleaning procedure. Three shapes of deposited particles are simultaneously identified on the treated samples. The 3D finite-difference time-domain (FDTD) was used to simulate the light field distribution near the deposited particles, which demonstrates that fused silica is subject to more light modulation when a particle is exposed on the front surface laser than on the rear surface laser. In addition, dense particles barely increase the light intensification factor (LIF) while markedly increase the light focused probability inside fused silica. Moreover, a multiple linear regression (MLR) analysis for the LIF builds a fitting plane model of the LIF and the particle height as well as the horizontal size, revealing that the LIF increases with the size of the deposited particle, especially its height. The laser damage testing results indicate that a deposited layer of  ∼76 in height had little influence on the laser-induced damage threshold (LIDT) of the optics and larger deposited particles with up to 9 µm thickness may deteriorate the LIDT to 41.62% that of the reference sample. Both the simulation and experimental results demonstrate that deposited particles with a height of more than 0.1 µm should be inhibited to achieve fused silica with superior laser damage performance.
AbstractList Deposited substances generated from hydrofluoric acid based (HF-based) etching are found to be the precursors that deteriorate the resistance of fused silica optics to laser damage. In this paper, the surface of polished fused silica was treated with a buffer oxide etchant (BOE, 5-10%wt. HF + 10%wt. +80-85 . ). The optic surface area affected by the etching-induced deposits ( ) was found to increase significantly with the amount of material removal and sensitivity to the post-cleaning procedure. Three shapes of deposited particles are simultaneously identified on the treated samples. The 3D finite-difference time-domain (FDTD) was used to simulate the light field distribution near the deposited particles, which demonstrates that fused silica is subject to more light modulation when a particle is exposed on the front surface laser than on the rear surface laser. In addition, dense particles barely increase the light intensification factor (LIF) while markedly increase the light focused probability inside fused silica. Moreover, a multiple linear regression (MLR) analysis for the LIF builds a fitting plane model of the LIF and the particle height as well as the horizontal size, revealing that the LIF increases with the size of the deposited particle, especially its height. The laser damage testing results indicate that a deposited layer of  ∼76 in height had little influence on the laser-induced damage threshold (LIDT) of the optics and larger deposited particles with up to 9 µm thickness may deteriorate the LIDT to 41.62% that of the reference sample. Both the simulation and experimental results demonstrate that deposited particles with a height of more than 0.1 µm should be inhibited to achieve fused silica with superior laser damage performance.
Author Qian, Yuan
Cui, Zhuangzhuang
Li, Zhuang
Ye, Hui
Yang, Wei
Author_xml – sequence: 1
  givenname: Hui
  surname: Ye
  fullname: Ye, Hui
– sequence: 2
  givenname: Zhuangzhuang
  surname: Cui
  fullname: Cui, Zhuangzhuang
– sequence: 3
  givenname: Zhuang
  surname: Li
  fullname: Li, Zhuang
– sequence: 4
  givenname: Wei
  surname: Yang
  fullname: Yang, Wei
– sequence: 5
  givenname: Yuan
  surname: Qian
  fullname: Qian, Yuan
BackLink https://www.ncbi.nlm.nih.gov/pubmed/36606925$$D View this record in MEDLINE/PubMed
BookMark eNo1j8tKxDAYhYMozkUXvoDkBTrm0iTNchh0FAZmo-shbf7YSJuUJl3M29vBcXXgO4cPzgrdhhgAoSdKNpTL8mV73JRKcM1u0JJRIQpOpVigVUo_hHBRanWPFlxKIjUTSxT3EGA02ceAo8NNC71vTIctDDH5nPDM3ZTA4uS7ucFxyL5J2ASLcwt-xH20U3cVhAvDnf9uM_YhQ5gVZ2x9yqOvp8vmAd050yV4vOYafb29fu7ei8Nx_7HbHoqGEZ4LZ6mmqjS21spSApwBJRWnQpWKWKugktoRSR0hTjtQVIG0hsi60rWrSsrW6PnPO0x1D_Y0jL434_n0_5z9AraXW3g
ContentType Journal Article
DBID NPM
DOI 10.1364/AO.475392
DatabaseName PubMed
DatabaseTitle PubMed
DatabaseTitleList PubMed
Database_xml – sequence: 1
  dbid: NPM
  name: PubMed
  url: https://proxy.k.utb.cz/login?url=http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed
  sourceTypes: Index Database
DeliveryMethod no_fulltext_linktorsrc
Discipline Physics
EISSN 2155-3165
ExternalDocumentID 36606925
Genre Journal Article
GroupedDBID 53G
5GY
8SL
ALMA_UNASSIGNED_HOLDINGS
H~9
NPM
OPLUZ
ROP
ROS
ID FETCH-LOGICAL-c203t-fd19174adb97d10e32e1083157470dd7e869f061f00f9fe717e6da06b89bf8412
IngestDate Thu Jan 02 22:53:03 EST 2025
IsPeerReviewed true
IsScholarly true
Issue 36
Language English
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c203t-fd19174adb97d10e32e1083157470dd7e869f061f00f9fe717e6da06b89bf8412
PMID 36606925
ParticipantIDs pubmed_primary_36606925
PublicationCentury 2000
PublicationDate 2022-Dec-20
PublicationDateYYYYMMDD 2022-12-20
PublicationDate_xml – month: 12
  year: 2022
  text: 2022-Dec-20
  day: 20
PublicationDecade 2020
PublicationPlace United States
PublicationPlace_xml – name: United States
PublicationTitle Applied optics. Optical technology and biomedical optics
PublicationTitleAlternate Appl Opt
PublicationYear 2022
SSID ssj0035497
Score 2.3994198
Snippet Deposited substances generated from hydrofluoric acid based (HF-based) etching are found to be the precursors that deteriorate the resistance of fused silica...
SourceID pubmed
SourceType Index Database
StartPage 10669
Title Generation of chemical deposits on fused silica optics and their modulation on the light intensity distribution
URI https://www.ncbi.nlm.nih.gov/pubmed/36606925
Volume 61
hasFullText
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV1JS-xAEG7GJ4oXcfe50QdvQ8YsnWRyfIgiHvSiKF4k6UUHNBmYycW_4x991VXpTHBDvTRDdzbyfdOpvRg7zNNcBamJPV9nxhN66Hu5kMYzuRSRUIUUFOV7kZxdi_Pb-LbXe-1ELdXTYiBfPswr-Q2qMAe42izZHyDbXhQm4DfgCyMgDOO3MKaa0U7mky73X2kMxUJHgKknIFJORtY216_GbVFmchA8V6pp39U4DfpPVlnHIhIlRmsoW1i36YnVFWSd9EqXHPQvx2QUn7amerwNZffjCh05s9HiR68etU6QGuMK7h7rvHx4wbENFuqstOc3du4bPeoaLkLsoRKSD0bjBgfShvXCU68ItxtTafaGdVF3bwXllbq6vNv1o0TY6hOXAwHKF7XW66A_fkb4owR0tYyyrL9efVOA2y3NsTlQRWxvVWsQoo99BOp12hSsgqc4ap9hiS26894oLCi4XK2w5Ubj4P-IPqusp8s1toCRv3KyzqoZiXhluCMRdyTiMI8k4kQiTjhyQJcjifiMRPZYmONIIt6SiHdJtMGuT0-ujs-8pguHJ0M_mnpGWZVe5KrIUhX4Ogp1YNvTxaCI-kqlephkBqRC4_smMzoNUp2o3E-KYVaYoQjCTfanrEq9zbhQIs7DpLC5qUKmMgsMaA9ZKI2RIPfGf9kWvan7MZVauXfvcOfTlV22NCPXHps38N_W-yAoTosDhOo_n_9uww
linkProvider National Library of Medicine
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Generation+of+chemical+deposits+on+fused+silica+optics+and+their+modulation+on+the+light+intensity+distribution&rft.jtitle=Applied+optics.+Optical+technology+and+biomedical+optics&rft.au=Ye%2C+Hui&rft.au=Cui%2C+Zhuangzhuang&rft.au=Li%2C+Zhuang&rft.au=Yang%2C+Wei&rft.date=2022-12-20&rft.eissn=2155-3165&rft.volume=61&rft.issue=36&rft.spage=10669&rft_id=info:doi/10.1364%2FAO.475392&rft_id=info%3Apmid%2F36606925&rft_id=info%3Apmid%2F36606925&rft.externalDocID=36606925