Behavior Study of ZnO Thin Films Grown by PLD for Several Applications

In this work, the effects of glass and Si polycrystalline substrates on structural, morphological, optical and electrical properties of zinc oxide thin films (ZnO) deposited at 450°C by pulsed laser deposition technique (PLD) have been investigated. KrF excimer laser (248 nm, 25 ns, 5 Hz, 2 J/cm 2 )...

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Published inCrystallography reports Vol. 67; no. 7; pp. 1239 - 1245
Main Authors Kermiche, F., Taabouche, A., Bouabellou, A., Hanini, F., Bouachiba, Y.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 01.12.2022
Springer Nature B.V
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Abstract In this work, the effects of glass and Si polycrystalline substrates on structural, morphological, optical and electrical properties of zinc oxide thin films (ZnO) deposited at 450°C by pulsed laser deposition technique (PLD) have been investigated. KrF excimer laser (248 nm, 25 ns, 5 Hz, 2 J/cm 2 ) was used as a source. X-ray diffraction patterns showed that ZnO thin films have been crystallized in hexagonal wurtzite-type structure with a preferred (002) orientation. Highly c-axis preferred orientation, which is critical for piezoelectric applications. The grain sizes calculated from X ray diffraction (XRD) patterns varies from 37 to 22 nm. All the films have a good surface morphology. Optical waveguiding properties of the films were characterized by using prism-coupling method. The distinct M-lines of the guided transverse magnetic (TM) and transverse electric (TE) modes of the ZnO films waveguide have been observed. In the aim to study the optical properties of the ZnO films, an accurate refractive index and thickness measurement apparatus was set up, which is called M-lines device. An evaluation of experimental uncertainty and calculation of the precision of the refractive index and thickness were developed on the ZnO films. The optical transmittance spectra showed good transparency in the visible region. Optical band gap calculated equal to 3.22 eV.
AbstractList In this work, the effects of glass and Si polycrystalline substrates on structural, morphological, optical and electrical properties of zinc oxide thin films (ZnO) deposited at 450°C by pulsed laser deposition technique (PLD) have been investigated. KrF excimer laser (248 nm, 25 ns, 5 Hz, 2 J/cm 2 ) was used as a source. X-ray diffraction patterns showed that ZnO thin films have been crystallized in hexagonal wurtzite-type structure with a preferred (002) orientation. Highly c-axis preferred orientation, which is critical for piezoelectric applications. The grain sizes calculated from X ray diffraction (XRD) patterns varies from 37 to 22 nm. All the films have a good surface morphology. Optical waveguiding properties of the films were characterized by using prism-coupling method. The distinct M-lines of the guided transverse magnetic (TM) and transverse electric (TE) modes of the ZnO films waveguide have been observed. In the aim to study the optical properties of the ZnO films, an accurate refractive index and thickness measurement apparatus was set up, which is called M-lines device. An evaluation of experimental uncertainty and calculation of the precision of the refractive index and thickness were developed on the ZnO films. The optical transmittance spectra showed good transparency in the visible region. Optical band gap calculated equal to 3.22 eV.
In this work, the effects of glass and Si polycrystalline substrates on structural, morphological, optical and electrical properties of zinc oxide thin films (ZnO) deposited at 450°C by pulsed laser deposition technique (PLD) have been investigated. KrF excimer laser (248 nm, 25 ns, 5 Hz, 2 J/cm2) was used as a source. X-ray diffraction patterns showed that ZnO thin films have been crystallized in hexagonal wurtzite-type structure with a preferred (002) orientation. Highly c-axis preferred orientation, which is critical for piezoelectric applications. The grain sizes calculated from X ray diffraction (XRD) patterns varies from 37 to 22 nm. All the films have a good surface morphology. Optical waveguiding properties of the films were characterized by using prism-coupling method. The distinct M-lines of the guided transverse magnetic (TM) and transverse electric (TE) modes of the ZnO films waveguide have been observed. In the aim to study the optical properties of the ZnO films, an accurate refractive index and thickness measurement apparatus was set up, which is called M-lines device. An evaluation of experimental uncertainty and calculation of the precision of the refractive index and thickness were developed on the ZnO films. The optical transmittance spectra showed good transparency in the visible region. Optical band gap calculated equal to 3.22 eV.
Author Taabouche, A.
Bouabellou, A.
Kermiche, F.
Hanini, F.
Bouachiba, Y.
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Snippet In this work, the effects of glass and Si polycrystalline substrates on structural, morphological, optical and electrical properties of zinc oxide thin films...
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SubjectTerms Crystallization
Crystallography and Scattering Methods
Diffraction patterns
Electrical properties
Excimer lasers
Excimers
Glass substrates
Grain size
Krypton fluoride lasers
Mathematical analysis
Morphology
Optical properties
Physics
Physics and Astronomy
Piezoelectricity
Preferred orientation
Pulsed laser deposition
Pulsed lasers
Refractivity
Silicon substrates
Surface
Thickness measurement
Thin Films
Waveguides
Wurtzite
X-ray diffraction
Zinc oxide
Zinc oxides
Title Behavior Study of ZnO Thin Films Grown by PLD for Several Applications
URI https://link.springer.com/article/10.1134/S1063774522070069
https://www.proquest.com/docview/2775252332/abstract/
Volume 67
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