A comparative study of the reactivity of the silicon atom Si(3PJ) towards O2 and NO molecules at very low temperature
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Published in | Physical chemistry chemical physics : PCCP Vol. 4; no. 15; pp. 3659 - 3664 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Royal Society of Chemistry
18.07.2002
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Subjects | |
Online Access | Get full text |
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ISSN: | 1463-9076 1463-9084 |
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DOI: | 10.1039/b201374f |