Influence of the deposition parameters on the nanolamella periodicity of chemical vapor deposited Ti1-xAlxN - Saringer, Christian; Tkadletz, Michael; Thurner, Josef; Czettl, Christoph; Schalk, Nina (Materials letters, 2021)
Keywords: Chemical vapor deposition; CVD; Lamella; Materials science; Nanolamellae; Parameters; Rotation; TEM; TiAlN; CVD; Nanolamellae; TEM; TiAlN